Exposure apparatus, exposure method, and fabricating method of display panel substrate
An exposure apparatus, an exposure method and a fabricating method of display panel substrate for precisely detecting a strength distribution of a light beam irradiating from a light irradiating device are provided. A detecting tool (50) which shields a portion of a light beam irradiating from a lig...
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| creator | KAMAISHI, TAKAO |
| description | An exposure apparatus, an exposure method and a fabricating method of display panel substrate for precisely detecting a strength distribution of a light beam irradiating from a light irradiating device are provided. A detecting tool (50) which shields a portion of a light beam irradiating from a light irradiating device (20) moves in an irradiated region (26a) of the light beam irradiating from the light irradiating device (20); meanwhile, the light beam irradiating from the light irradiating device (20) with a portion thereof shielded by the detecting tool (50) is received, and an entire strength of the received light beam is detected. According to a change in the entire strength of the received light beam as a movement of the detecting tool, the strength of the light beam shielded by the detecting tool (50) and a position of the detecting tool (50) are detected in order to detect a strength distribution of the light beam. An unevenness of the strength distribution of the light beam is corrected according to |
| format | Patent |
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A detecting tool (50) which shields a portion of a light beam irradiating from a light irradiating device (20) moves in an irradiated region (26a) of the light beam irradiating from the light irradiating device (20); meanwhile, the light beam irradiating from the light irradiating device (20) with a portion thereof shielded by the detecting tool (50) is received, and an entire strength of the received light beam is detected. According to a change in the entire strength of the received light beam as a movement of the detecting tool, the strength of the light beam shielded by the detecting tool (50) and a position of the detecting tool (50) are detected in order to detect a strength distribution of the light beam. 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Exposure apparatus, exposure method, and fabricating method of display panel substrate |
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