Bibenzoxazinone compound
The object of the invention is to provide a bibenzoxazinone compound substantially free of alkali metal salt and is highly pure, and may form a resin composition excellent with hydrolysis resistance when it is contained in a resin. The invention is represented by the following formula (4) (wherein R...
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| creator | MIYAKE, TERU YOSHIDA, MASAKANE HAYASHI, MASAYUKI IBUSUKI, SHUN KOGA, TAKASHI |
| description | The object of the invention is to provide a bibenzoxazinone compound substantially free of alkali metal salt and is highly pure, and may form a resin composition excellent with hydrolysis resistance when it is contained in a resin. The invention is represented by the following formula (4) (wherein R.sub.1 and R.sub.2 respectively independently represents a hydrogen, hydroxyl group, and alkyl group having 1-3 carbon atoms). (i)The purity is above 98%, (ii) the content of the compound represented by the following formula (7) is less than 0.15wt%. (iii) Formula (7) in the measurement of light reflectivity in the visible light zone in powder form, the maximum peak is in the range of from 380 nm to 480 nm and the maximum light reflectivity is 100% to 120%. (iv) the content of sodium is less than 50 ppm, (v) YI value is between -10 and 10. The invention also relates to the manufacturing method thereof and a resin composition including the compound. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW201118074A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW201118074A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW201118074A3</originalsourceid><addsrcrecordid>eNrjZJBwykxKzavKr0isyszLz0tVSM7PLcgvzUvhYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxIeFGBoaGhhYG5iaOxsSoAQAnXiLd</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Bibenzoxazinone compound</title><source>esp@cenet</source><creator>MIYAKE, TERU ; YOSHIDA, MASAKANE ; HAYASHI, MASAYUKI ; IBUSUKI, SHUN ; KOGA, TAKASHI</creator><creatorcontrib>MIYAKE, TERU ; YOSHIDA, MASAKANE ; HAYASHI, MASAYUKI ; IBUSUKI, SHUN ; KOGA, TAKASHI</creatorcontrib><description>The object of the invention is to provide a bibenzoxazinone compound substantially free of alkali metal salt and is highly pure, and may form a resin composition excellent with hydrolysis resistance when it is contained in a resin. The invention is represented by the following formula (4) (wherein R.sub.1 and R.sub.2 respectively independently represents a hydrogen, hydroxyl group, and alkyl group having 1-3 carbon atoms). (i)The purity is above 98%, (ii) the content of the compound represented by the following formula (7) is less than 0.15wt%. (iii) Formula (7) in the measurement of light reflectivity in the visible light zone in powder form, the maximum peak is in the range of from 380 nm to 480 nm and the maximum light reflectivity is 100% to 120%. (iv) the content of sodium is less than 50 ppm, (v) YI value is between -10 and 10. The invention also relates to the manufacturing method thereof and a resin composition including the compound.</description><language>chi ; eng</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; GENERAL PROCESSES OF COMPOUNDING ; HETEROCYCLIC COMPOUNDS ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; METALLURGY ; ORGANIC CHEMISTRY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS ; WORKING-UP</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110601&DB=EPODOC&CC=TW&NR=201118074A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110601&DB=EPODOC&CC=TW&NR=201118074A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MIYAKE, TERU</creatorcontrib><creatorcontrib>YOSHIDA, MASAKANE</creatorcontrib><creatorcontrib>HAYASHI, MASAYUKI</creatorcontrib><creatorcontrib>IBUSUKI, SHUN</creatorcontrib><creatorcontrib>KOGA, TAKASHI</creatorcontrib><title>Bibenzoxazinone compound</title><description>The object of the invention is to provide a bibenzoxazinone compound substantially free of alkali metal salt and is highly pure, and may form a resin composition excellent with hydrolysis resistance when it is contained in a resin. The invention is represented by the following formula (4) (wherein R.sub.1 and R.sub.2 respectively independently represents a hydrogen, hydroxyl group, and alkyl group having 1-3 carbon atoms). (i)The purity is above 98%, (ii) the content of the compound represented by the following formula (7) is less than 0.15wt%. (iii) Formula (7) in the measurement of light reflectivity in the visible light zone in powder form, the maximum peak is in the range of from 380 nm to 480 nm and the maximum light reflectivity is 100% to 120%. (iv) the content of sodium is less than 50 ppm, (v) YI value is between -10 and 10. The invention also relates to the manufacturing method thereof and a resin composition including the compound.</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJBwykxKzavKr0isyszLz0tVSM7PLcgvzUvhYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxIeFGBoaGhhYG5iaOxsSoAQAnXiLd</recordid><startdate>20110601</startdate><enddate>20110601</enddate><creator>MIYAKE, TERU</creator><creator>YOSHIDA, MASAKANE</creator><creator>HAYASHI, MASAYUKI</creator><creator>IBUSUKI, SHUN</creator><creator>KOGA, TAKASHI</creator><scope>EVB</scope></search><sort><creationdate>20110601</creationdate><title>Bibenzoxazinone compound</title><author>MIYAKE, TERU ; YOSHIDA, MASAKANE ; HAYASHI, MASAYUKI ; IBUSUKI, SHUN ; KOGA, TAKASHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW201118074A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2011</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>MIYAKE, TERU</creatorcontrib><creatorcontrib>YOSHIDA, MASAKANE</creatorcontrib><creatorcontrib>HAYASHI, MASAYUKI</creatorcontrib><creatorcontrib>IBUSUKI, SHUN</creatorcontrib><creatorcontrib>KOGA, TAKASHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MIYAKE, TERU</au><au>YOSHIDA, MASAKANE</au><au>HAYASHI, MASAYUKI</au><au>IBUSUKI, SHUN</au><au>KOGA, TAKASHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Bibenzoxazinone compound</title><date>2011-06-01</date><risdate>2011</risdate><abstract>The object of the invention is to provide a bibenzoxazinone compound substantially free of alkali metal salt and is highly pure, and may form a resin composition excellent with hydrolysis resistance when it is contained in a resin. The invention is represented by the following formula (4) (wherein R.sub.1 and R.sub.2 respectively independently represents a hydrogen, hydroxyl group, and alkyl group having 1-3 carbon atoms). (i)The purity is above 98%, (ii) the content of the compound represented by the following formula (7) is less than 0.15wt%. (iii) Formula (7) in the measurement of light reflectivity in the visible light zone in powder form, the maximum peak is in the range of from 380 nm to 480 nm and the maximum light reflectivity is 100% to 120%. (iv) the content of sodium is less than 50 ppm, (v) YI value is between -10 and 10. The invention also relates to the manufacturing method thereof and a resin composition including the compound.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING HETEROCYCLIC COMPOUNDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS WORKING-UP |
| title | Bibenzoxazinone compound |
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