Wafer holding robot end effecter vertical position determination in ion implanter system

Wafer holding robot end effecter vertical position determination in ion implanter system

A wafer handling robot, ion implanter system including a wafer handling robot and a related method are disclosed. An ion implanter system may include an ion implanting station including a load lock coupled thereto; a wafer handling robot located at least partially within the load lock, the wafer han...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: POITRAS, ROBERT A, DANIELS, KEVIN, BINNS, BRANNT S
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator POITRAS, ROBERT A
DANIELS, KEVIN
BINNS, BRANNT S
description A wafer handling robot, ion implanter system including a wafer handling robot and a related method are disclosed. An ion implanter system may include an ion implanting station including a load lock coupled thereto; a wafer handling robot located at least partially within the load lock, the wafer handling robot including an end effecter for handling at least one wafer, and a motor for moving the end effecter vertically; and a sensor positioned within the load lock to determine a vertical position of the end effecter.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW200837873A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW200837873A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW200837873A3</originalsourceid><addsrcrecordid>eNrjZIgIT0xLLVLIyM9JycxLVyjKT8ovUUjNS1FITUtLTS4BSpWlFpVkJifmKBTkF2eWZObnKaSkAsVzM_MSwbxMIAJRuQU5iXkgDcWVxSWpuTwMrGmJOcWpvFCam0HRzTXE2UM3tSA_PrW4IDE5NS-1JD4k3MjAwMLY3MLc2NGYGDUA6Uk7Kg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Wafer holding robot end effecter vertical position determination in ion implanter system</title><source>esp@cenet</source><creator>POITRAS, ROBERT A ; DANIELS, KEVIN ; BINNS, BRANNT S</creator><creatorcontrib>POITRAS, ROBERT A ; DANIELS, KEVIN ; BINNS, BRANNT S</creatorcontrib><description>A wafer handling robot, ion implanter system including a wafer handling robot and a related method are disclosed. An ion implanter system may include an ion implanting station including a load lock coupled thereto; a wafer handling robot located at least partially within the load lock, the wafer handling robot including an end effecter for handling at least one wafer, and a motor for moving the end effecter vertically; and a sensor positioned within the load lock to determine a vertical position of the end effecter.</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080916&amp;DB=EPODOC&amp;CC=TW&amp;NR=200837873A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080916&amp;DB=EPODOC&amp;CC=TW&amp;NR=200837873A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>POITRAS, ROBERT A</creatorcontrib><creatorcontrib>DANIELS, KEVIN</creatorcontrib><creatorcontrib>BINNS, BRANNT S</creatorcontrib><title>Wafer holding robot end effecter vertical position determination in ion implanter system</title><description>A wafer handling robot, ion implanter system including a wafer handling robot and a related method are disclosed. An ion implanter system may include an ion implanting station including a load lock coupled thereto; a wafer handling robot located at least partially within the load lock, the wafer handling robot including an end effecter for handling at least one wafer, and a motor for moving the end effecter vertically; and a sensor positioned within the load lock to determine a vertical position of the end effecter.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIgIT0xLLVLIyM9JycxLVyjKT8ovUUjNS1FITUtLTS4BSpWlFpVkJifmKBTkF2eWZObnKaSkAsVzM_MSwbxMIAJRuQU5iXkgDcWVxSWpuTwMrGmJOcWpvFCam0HRzTXE2UM3tSA_PrW4IDE5NS-1JD4k3MjAwMLY3MLc2NGYGDUA6Uk7Kg</recordid><startdate>20080916</startdate><enddate>20080916</enddate><creator>POITRAS, ROBERT A</creator><creator>DANIELS, KEVIN</creator><creator>BINNS, BRANNT S</creator><scope>EVB</scope></search><sort><creationdate>20080916</creationdate><title>Wafer holding robot end effecter vertical position determination in ion implanter system</title><author>POITRAS, ROBERT A ; DANIELS, KEVIN ; BINNS, BRANNT S</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW200837873A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2008</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>POITRAS, ROBERT A</creatorcontrib><creatorcontrib>DANIELS, KEVIN</creatorcontrib><creatorcontrib>BINNS, BRANNT S</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>POITRAS, ROBERT A</au><au>DANIELS, KEVIN</au><au>BINNS, BRANNT S</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Wafer holding robot end effecter vertical position determination in ion implanter system</title><date>2008-09-16</date><risdate>2008</risdate><abstract>A wafer handling robot, ion implanter system including a wafer handling robot and a related method are disclosed. An ion implanter system may include an ion implanting station including a load lock coupled thereto; a wafer handling robot located at least partially within the load lock, the wafer handling robot including an end effecter for handling at least one wafer, and a motor for moving the end effecter vertically; and a sensor positioned within the load lock to determine a vertical position of the end effecter.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_TW200837873A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title Wafer holding robot end effecter vertical position determination in ion implanter system
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T19%3A45%3A11IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=POITRAS,%20ROBERT%20A&rft.date=2008-09-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ETW200837873A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true