Photosensitive resin composite
A photosensitive resin composite having excellent alkali developing property and a photospacer having excellent flexibility and elastic recovery property are provided. A alkali developing photosensitive resin composite (Q) for photospacer includes hydrophilic polymer (A), mutli functional (meth)acry...
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| creator | YAMAMOTO, YUSUKE OIKE, TAKURO ADACHI, SHINYA |
| description | A photosensitive resin composite having excellent alkali developing property and a photospacer having excellent flexibility and elastic recovery property are provided. A alkali developing photosensitive resin composite (Q) for photospacer includes hydrophilic polymer (A), mutli functional (meth)acrylate monomer (B), polysiloxane (C) having more than one hydrolytic alkoxy group, and initiators of photo free radical polymerization (D). Preferably, the photosensitive resin composite includes a (C) which is a condensation compound (C1) obtained by condensating at least one of the silane compound (c1) as shown in formula (1) and the silane compound (c2) as shown in formula (2) as absolutely necessary monomer. R2mSi(R1)(OR3)3-m (1) In the formula (1), R1 is an organic group selected from at least one of (meth)acryloyloxy alkyl group, glycidoxy alkyl group, mercapto alkyl group and amino alkyl group, in which the alkyl group has 1-6 carbons. R2 is an aliphatic saturated alkyl group having 6-12 carbons or an aromatic |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW200736830A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW200736830A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW200736830A3</originalsourceid><addsrcrecordid>eNrjZJALyMgvyS9OzSvOLMksS1UoSi3OzFNIzs8tyAeKpPIwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTk1LzUkviQcCMDA3NjMwtjA0djYtQAAD-pJUs</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Photosensitive resin composite</title><source>esp@cenet</source><creator>YAMAMOTO, YUSUKE ; OIKE, TAKURO ; ADACHI, SHINYA</creator><creatorcontrib>YAMAMOTO, YUSUKE ; OIKE, TAKURO ; ADACHI, SHINYA</creatorcontrib><description>A photosensitive resin composite having excellent alkali developing property and a photospacer having excellent flexibility and elastic recovery property are provided. A alkali developing photosensitive resin composite (Q) for photospacer includes hydrophilic polymer (A), mutli functional (meth)acrylate monomer (B), polysiloxane (C) having more than one hydrolytic alkoxy group, and initiators of photo free radical polymerization (D). Preferably, the photosensitive resin composite includes a (C) which is a condensation compound (C1) obtained by condensating at least one of the silane compound (c1) as shown in formula (1) and the silane compound (c2) as shown in formula (2) as absolutely necessary monomer. R2mSi(R1)(OR3)3-m (1) In the formula (1), R1 is an organic group selected from at least one of (meth)acryloyloxy alkyl group, glycidoxy alkyl group, mercapto alkyl group and amino alkyl group, in which the alkyl group has 1-6 carbons. R2 is an aliphatic saturated alkyl group having 6-12 carbons or an aromatic</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; ELECTROGRAPHY ; FREQUENCY-CHANGING ; HOLOGRAPHY ; MATERIALS THEREFOR ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20071001&DB=EPODOC&CC=TW&NR=200736830A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20071001&DB=EPODOC&CC=TW&NR=200736830A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YAMAMOTO, YUSUKE</creatorcontrib><creatorcontrib>OIKE, TAKURO</creatorcontrib><creatorcontrib>ADACHI, SHINYA</creatorcontrib><title>Photosensitive resin composite</title><description>A photosensitive resin composite having excellent alkali developing property and a photospacer having excellent flexibility and elastic recovery property are provided. A alkali developing photosensitive resin composite (Q) for photospacer includes hydrophilic polymer (A), mutli functional (meth)acrylate monomer (B), polysiloxane (C) having more than one hydrolytic alkoxy group, and initiators of photo free radical polymerization (D). Preferably, the photosensitive resin composite includes a (C) which is a condensation compound (C1) obtained by condensating at least one of the silane compound (c1) as shown in formula (1) and the silane compound (c2) as shown in formula (2) as absolutely necessary monomer. R2mSi(R1)(OR3)3-m (1) In the formula (1), R1 is an organic group selected from at least one of (meth)acryloyloxy alkyl group, glycidoxy alkyl group, mercapto alkyl group and amino alkyl group, in which the alkyl group has 1-6 carbons. R2 is an aliphatic saturated alkyl group having 6-12 carbons or an aromatic</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>ELECTROGRAPHY</subject><subject>FREQUENCY-CHANGING</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>NON-LINEAR OPTICS</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJALyMgvyS9OzSvOLMksS1UoSi3OzFNIzs8tyAeKpPIwsKYl5hSn8kJpbgZFN9cQZw_d1IL8-NTigsTk1LzUkviQcCMDA3NjMwtjA0djYtQAAD-pJUs</recordid><startdate>20071001</startdate><enddate>20071001</enddate><creator>YAMAMOTO, YUSUKE</creator><creator>OIKE, TAKURO</creator><creator>ADACHI, SHINYA</creator><scope>EVB</scope></search><sort><creationdate>20071001</creationdate><title>Photosensitive resin composite</title><author>YAMAMOTO, YUSUKE ; OIKE, TAKURO ; ADACHI, SHINYA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW200736830A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2007</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>ELECTROGRAPHY</topic><topic>FREQUENCY-CHANGING</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><toplevel>online_resources</toplevel><creatorcontrib>YAMAMOTO, YUSUKE</creatorcontrib><creatorcontrib>OIKE, TAKURO</creatorcontrib><creatorcontrib>ADACHI, SHINYA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YAMAMOTO, YUSUKE</au><au>OIKE, TAKURO</au><au>ADACHI, SHINYA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Photosensitive resin composite</title><date>2007-10-01</date><risdate>2007</risdate><abstract>A photosensitive resin composite having excellent alkali developing property and a photospacer having excellent flexibility and elastic recovery property are provided. A alkali developing photosensitive resin composite (Q) for photospacer includes hydrophilic polymer (A), mutli functional (meth)acrylate monomer (B), polysiloxane (C) having more than one hydrolytic alkoxy group, and initiators of photo free radical polymerization (D). Preferably, the photosensitive resin composite includes a (C) which is a condensation compound (C1) obtained by condensating at least one of the silane compound (c1) as shown in formula (1) and the silane compound (c2) as shown in formula (2) as absolutely necessary monomer. R2mSi(R1)(OR3)3-m (1) In the formula (1), R1 is an organic group selected from at least one of (meth)acryloyloxy alkyl group, glycidoxy alkyl group, mercapto alkyl group and amino alkyl group, in which the alkyl group has 1-6 carbons. R2 is an aliphatic saturated alkyl group having 6-12 carbons or an aromatic</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
| title | Photosensitive resin composite |
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