Apparatus for measuring feature widths on masks for the semiconductor industry

An apparatus for measuring feature widths on masks (1) for the semiconductor industry is disclosed. The apparatus encompasses a carrier plate (16) that is retained in vibrationally decoupled fashion in a base frame (14); a scanning stage (18), arranged on the carrier plate (16), that carries a mask...

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Bibliographische Detailangaben
Hauptverfasser:	BRUECK, HANS-JUERGEN, VOLLRATH, WOLFGANG, HILLMANN, FRANK, SCHEURING, GERD
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS TESTING
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Beschreibung
Zusammenfassung:	An apparatus for measuring feature widths on masks (1) for the semiconductor industry is disclosed. The apparatus encompasses a carrier plate (16) that is retained in vibrationally decoupled fashion in a base frame (14); a scanning stage (18), arranged on the carrier plate (16), that carries a mask (1) to be measured, the mask (1) defining a surface (4); and an objective (2) arranged opposite the mask (1). A liquid (25) is provided between the objective (2) and the surface (4) of the mask (1).