1, 2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition
The invention provides a 1, 2-naphthoquinone-2-diazidesulfonate ester photosensitive agent which is useful as a photosensitive agent employed in a photoresist for producing semiconductor integrated circuits, liquid crystal displays, EL displays, etc., a method for producing the photosensitive agent,...
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| creator | TSUNEAKI MIYAZAKI HAGIWARA, YUICHI SUWA, MIHARU TADA, KATSUMI KATORI, SUEHIRO IIDA, HIROTADA |
| description | The invention provides a 1, 2-naphthoquinone-2-diazidesulfonate ester photosensitive agent which is useful as a photosensitive agent employed in a photoresist for producing semiconductor integrated circuits, liquid crystal displays, EL displays, etc., a method for producing the photosensitive agent, and a photoresist composition containing the photosensitive agent. The l, 2-naphthoquinone-2-diazidesulfonate ester photosensitive agent is produced by reacting a polyhydric phenol with l, 2-naphthoquinone-2-diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyhydric phenol is obtained by a condensation reaction between resorcinol and at least one aldehyde selected from C3-C1O aldehydes, and contains, as a predominant component, a compound represented by formula (I) and components exhibiting a retention time as measured by using GPC shorter than that of the compound represented by formula (I) in an amount of 10% or less: Wherein each of R1, R2, R3, and R4 represents a C2-C9 alkyl group |
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The l, 2-naphthoquinone-2-diazidesulfonate ester photosensitive agent is produced by reacting a polyhydric phenol with l, 2-naphthoquinone-2-diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyhydric phenol is obtained by a condensation reaction between resorcinol and at least one aldehyde selected from C3-C1O aldehydes, and contains, as a predominant component, a compound represented by formula (I) and components exhibiting a retention time as measured by using GPC shorter than that of the compound represented by formula (I) in an amount of 10% or less: Wherein each of R1, R2, R3, and R4 represents a C2-C9 alkyl group</description><language>chi ; eng</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC CHEMISTRY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20031016&DB=EPODOC&CC=TW&NR=200305060A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20031016&DB=EPODOC&CC=TW&NR=200305060A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TSUNEAKI MIYAZAKI</creatorcontrib><creatorcontrib>HAGIWARA, YUICHI</creatorcontrib><creatorcontrib>SUWA, MIHARU</creatorcontrib><creatorcontrib>TADA, KATSUMI</creatorcontrib><creatorcontrib>KATORI, SUEHIRO</creatorcontrib><creatorcontrib>IIDA, HIROTADA</creatorcontrib><title>1, 2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition</title><description>The invention provides a 1, 2-naphthoquinone-2-diazidesulfonate ester photosensitive agent which is useful as a photosensitive agent employed in a photoresist for producing semiconductor integrated circuits, liquid crystal displays, EL displays, etc., a method for producing the photosensitive agent, and a photoresist composition containing the photosensitive agent. The l, 2-naphthoquinone-2-diazidesulfonate ester photosensitive agent is produced by reacting a polyhydric phenol with l, 2-naphthoquinone-2-diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyhydric phenol is obtained by a condensation reaction between resorcinol and at least one aldehyde selected from C3-C1O aldehydes, and contains, as a predominant component, a compound represented by formula (I) and components exhibiting a retention time as measured by using GPC shorter than that of the compound represented by formula (I) in an amount of 10% or less: Wherein each of R1, R2, R3, and R4 represents a C2-C9 alkyl group</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyzEKwkAQheE0FqLeYewTWBO0F1GsrAKWYclOsgvJzJqZWHgH72xEW8HqFf_35slzk0KeXWz06vk2BmLCLM9csI_gUMauYbKKgKI4QPSsLEgSNNwRbIukKfQ4fR00PIGB3VgHakE9_uCW3KcMKEEUau4jvwnTMpk1thNcfXeRrE_H8nDOMHKFEm2NhFqV19yYwmzNzuyLf8wLvJFPDA</recordid><startdate>20031016</startdate><enddate>20031016</enddate><creator>TSUNEAKI MIYAZAKI</creator><creator>HAGIWARA, YUICHI</creator><creator>SUWA, MIHARU</creator><creator>TADA, KATSUMI</creator><creator>KATORI, SUEHIRO</creator><creator>IIDA, HIROTADA</creator><scope>EVB</scope></search><sort><creationdate>20031016</creationdate><title>1, 2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition</title><author>TSUNEAKI MIYAZAKI ; HAGIWARA, YUICHI ; SUWA, MIHARU ; TADA, KATSUMI ; KATORI, SUEHIRO ; IIDA, HIROTADA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW200305060A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2003</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>TSUNEAKI MIYAZAKI</creatorcontrib><creatorcontrib>HAGIWARA, YUICHI</creatorcontrib><creatorcontrib>SUWA, MIHARU</creatorcontrib><creatorcontrib>TADA, KATSUMI</creatorcontrib><creatorcontrib>KATORI, SUEHIRO</creatorcontrib><creatorcontrib>IIDA, HIROTADA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TSUNEAKI MIYAZAKI</au><au>HAGIWARA, YUICHI</au><au>SUWA, MIHARU</au><au>TADA, KATSUMI</au><au>KATORI, SUEHIRO</au><au>IIDA, HIROTADA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>1, 2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition</title><date>2003-10-16</date><risdate>2003</risdate><abstract>The invention provides a 1, 2-naphthoquinone-2-diazidesulfonate ester photosensitive agent which is useful as a photosensitive agent employed in a photoresist for producing semiconductor integrated circuits, liquid crystal displays, EL displays, etc., a method for producing the photosensitive agent, and a photoresist composition containing the photosensitive agent. The l, 2-naphthoquinone-2-diazidesulfonate ester photosensitive agent is produced by reacting a polyhydric phenol with l, 2-naphthoquinone-2-diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyhydric phenol is obtained by a condensation reaction between resorcinol and at least one aldehyde selected from C3-C1O aldehydes, and contains, as a predominant component, a compound represented by formula (I) and components exhibiting a retention time as measured by using GPC shorter than that of the compound represented by formula (I) in an amount of 10% or less: Wherein each of R1, R2, R3, and R4 represents a C2-C9 alkyl group</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | 1, 2-Naphthoquinone-2-diazidesulfonate ester photosensitive agent, method for producing the photosensitive agent, and photoresist composition |
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