EVAPORATOR

FIELD: vacuum equipment, particular, devices for application of resist in vacuum. SUBSTANCE: evaporator has additional chamber 18 with reciprocation mechanism 20 of crucible 5 and device for introduction of inert gas 19 and evacuation device 22 communicated with reaction chamber 1 by means of gate 2...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Kaplin L.N, Buravtsev A.T, Satarov G.Kh
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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