COMPOSITION RESPONSIBLE TO HIGH-FREQUENCY ELECTRIC FIELD

Bibliographische Detailangaben

Hauptverfasser:	ERMOLENKO IGOR N,SU, GAVRILOV MIKHAIL Z,SU, SVIRIDOVA REMMA N,SU, LAZAREVA TATYANA G,SU
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY ELECTROPHOTOGRAPHY HOLOGRAPHY MAGNETOGRAPHY PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS
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