Micromachining using high energy light ions

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Hauptverfasser: WATT FRANK, OSIPOWICZ THOMAS, BREESE MARK, SPRINGHAM STUART VICTOR
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Sprache:eng
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creator WATT FRANK
OSIPOWICZ THOMAS
BREESE MARK
SPRINGHAM STUART VICTOR
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_SG52858A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>SG52858A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_SG52858A13</originalsourceid><addsrcrecordid>eNrjZND2zUwuys9NTM7IzMvMS1coLQaRGZnpGQqpealF6ZUKOUB2iUJmfl4xDwNrWmJOcSovlOZmkHNzDXH20E0tyI9PLS5ITAZqKYkPdjc1sjC1cDQ0JqgAAIRRKGE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Micromachining using high energy light ions</title><source>esp@cenet</source><creator>WATT FRANK ; OSIPOWICZ THOMAS ; BREESE MARK ; SPRINGHAM STUART VICTOR</creator><creatorcontrib>WATT FRANK ; OSIPOWICZ THOMAS ; BREESE MARK ; SPRINGHAM STUART VICTOR</creatorcontrib><edition>6</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1998</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19980928&amp;DB=EPODOC&amp;CC=SG&amp;NR=52858A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19980928&amp;DB=EPODOC&amp;CC=SG&amp;NR=52858A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WATT FRANK</creatorcontrib><creatorcontrib>OSIPOWICZ THOMAS</creatorcontrib><creatorcontrib>BREESE MARK</creatorcontrib><creatorcontrib>SPRINGHAM STUART VICTOR</creatorcontrib><title>Micromachining using high energy light ions</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1998</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND2zUwuys9NTM7IzMvMS1coLQaRGZnpGQqpealF6ZUKOUB2iUJmfl4xDwNrWmJOcSovlOZmkHNzDXH20E0tyI9PLS5ITAZqKYkPdjc1sjC1cDQ0JqgAAIRRKGE</recordid><startdate>19980928</startdate><enddate>19980928</enddate><creator>WATT FRANK</creator><creator>OSIPOWICZ THOMAS</creator><creator>BREESE MARK</creator><creator>SPRINGHAM STUART VICTOR</creator><scope>EVB</scope></search><sort><creationdate>19980928</creationdate><title>Micromachining using high energy light ions</title><author>WATT FRANK ; OSIPOWICZ THOMAS ; BREESE MARK ; SPRINGHAM STUART VICTOR</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_SG52858A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1998</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>WATT FRANK</creatorcontrib><creatorcontrib>OSIPOWICZ THOMAS</creatorcontrib><creatorcontrib>BREESE MARK</creatorcontrib><creatorcontrib>SPRINGHAM STUART VICTOR</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WATT FRANK</au><au>OSIPOWICZ THOMAS</au><au>BREESE MARK</au><au>SPRINGHAM STUART VICTOR</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Micromachining using high energy light ions</title><date>1998-09-28</date><risdate>1998</risdate><edition>6</edition><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
title Micromachining using high energy light ions
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T01%3A54%3A16IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WATT%20FRANK&rft.date=1998-09-28&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ESG52858A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true