Use of oxalyl chloride to form chloride-doped silicon dioxide films on silicon substrates

A process of forming chlorine-doped silicon dioxide films on a silicon substrate comprises oxidizing the silicon substrate in the presence of a chlorine source, thereby forming the chlorine-doped silicon dioxide film on the silicon substrate, the chlorine source being oxalyl chloride.

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Bibliographische Detailangaben
Hauptverfasser: MCGEARY, MICHAEL, J, BOEGLIN, HERMAN, J
Format: Patent
Sprache:eng
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Zusammenfassung:A process of forming chlorine-doped silicon dioxide films on a silicon substrate comprises oxidizing the silicon substrate in the presence of a chlorine source, thereby forming the chlorine-doped silicon dioxide film on the silicon substrate, the chlorine source being oxalyl chloride.