SYSTEM AND METHOD FOR IMPRINT-GUIDED BLOCK COPOLYMER PATTERNING
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| creator | YANG, XIAOMIN LEE, KIM YANG XIAO, SHUAIGANG KUO, DAVID VAN DE VEERDONK, RENE JOHANNES MARINUS HU, WEI |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_SG2014012355A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>SG2014012355A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_SG2014012355A3</originalsourceid><addsrcrecordid>eNrjZLAPjgwOcfVVcPRzUfB1DfHwd1Fw8w9S8PQNCPL0C9F1D_V0cXVRcPLxd_ZWcPYP8PeJ9HUNUghwDAlxDfLz9HPnYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxwe5GBoYmBoZGxqamjsZEKQIA4zwq6w</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SYSTEM AND METHOD FOR IMPRINT-GUIDED BLOCK COPOLYMER PATTERNING</title><source>esp@cenet</source><creator>YANG, XIAOMIN ; LEE, KIM YANG ; XIAO, SHUAIGANG ; KUO, DAVID ; VAN DE VEERDONK, RENE JOHANNES MARINUS ; HU, WEI</creator><creatorcontrib>YANG, XIAOMIN ; LEE, KIM YANG ; XIAO, SHUAIGANG ; KUO, DAVID ; VAN DE VEERDONK, RENE JOHANNES MARINUS ; HU, WEI</creatorcontrib><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; INFORMATION STORAGE ; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER ; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES ; MATERIALS THEREFOR ; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES ; MICROSTRUCTURAL TECHNOLOGY ; NANOTECHNOLOGY ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS ; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES ; TRANSPORTING</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140730&DB=EPODOC&CC=SG&NR=2014012355A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140730&DB=EPODOC&CC=SG&NR=2014012355A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YANG, XIAOMIN</creatorcontrib><creatorcontrib>LEE, KIM YANG</creatorcontrib><creatorcontrib>XIAO, SHUAIGANG</creatorcontrib><creatorcontrib>KUO, DAVID</creatorcontrib><creatorcontrib>VAN DE VEERDONK, RENE JOHANNES MARINUS</creatorcontrib><creatorcontrib>HU, WEI</creatorcontrib><title>SYSTEM AND METHOD FOR IMPRINT-GUIDED BLOCK COPOLYMER PATTERNING</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>INFORMATION STORAGE</subject><subject>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</subject><subject>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</subject><subject>MATERIALS THEREFOR</subject><subject>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</subject><subject>MICROSTRUCTURAL TECHNOLOGY</subject><subject>NANOTECHNOLOGY</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS</subject><subject>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAPjgwOcfVVcPRzUfB1DfHwd1Fw8w9S8PQNCPL0C9F1D_V0cXVRcPLxd_ZWcPYP8PeJ9HUNUghwDAlxDfLz9HPnYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxwe5GBoYmBoZGxqamjsZEKQIA4zwq6w</recordid><startdate>20140730</startdate><enddate>20140730</enddate><creator>YANG, XIAOMIN</creator><creator>LEE, KIM YANG</creator><creator>XIAO, SHUAIGANG</creator><creator>KUO, DAVID</creator><creator>VAN DE VEERDONK, RENE JOHANNES MARINUS</creator><creator>HU, WEI</creator><scope>EVB</scope></search><sort><creationdate>20140730</creationdate><title>SYSTEM AND METHOD FOR IMPRINT-GUIDED BLOCK COPOLYMER PATTERNING</title><author>YANG, XIAOMIN ; LEE, KIM YANG ; XIAO, SHUAIGANG ; KUO, DAVID ; VAN DE VEERDONK, RENE JOHANNES MARINUS ; HU, WEI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_SG2014012355A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>INFORMATION STORAGE</topic><topic>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</topic><topic>MANUFACTURE OR TREATMENT OF NANOSTRUCTURES</topic><topic>MATERIALS THEREFOR</topic><topic>MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES</topic><topic>MICROSTRUCTURAL TECHNOLOGY</topic><topic>NANOTECHNOLOGY</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS</topic><topic>SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>YANG, XIAOMIN</creatorcontrib><creatorcontrib>LEE, KIM YANG</creatorcontrib><creatorcontrib>XIAO, SHUAIGANG</creatorcontrib><creatorcontrib>KUO, DAVID</creatorcontrib><creatorcontrib>VAN DE VEERDONK, RENE JOHANNES MARINUS</creatorcontrib><creatorcontrib>HU, WEI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YANG, XIAOMIN</au><au>LEE, KIM YANG</au><au>XIAO, SHUAIGANG</au><au>KUO, DAVID</au><au>VAN DE VEERDONK, RENE JOHANNES MARINUS</au><au>HU, WEI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SYSTEM AND METHOD FOR IMPRINT-GUIDED BLOCK COPOLYMER PATTERNING</title><date>2014-07-30</date><risdate>2014</risdate><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES MICROSTRUCTURAL TECHNOLOGY NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING |
| title | SYSTEM AND METHOD FOR IMPRINT-GUIDED BLOCK COPOLYMER PATTERNING |
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