IMPROVED ULTRASONIC CLEANING METHOD AND APPARATUS

A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatmentliquid. A resonator supplies ultrasonic or m...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIPPERT, ALEXANDER, HOLSTEYNS, FRANK LUDWIG
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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