AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES

An aqueous polishing composition having a pH of 3 to 11 and comprising (A) abrasive particles which are positively charged when dispersed in an aqueous medium free from component (B) and of a pH of 3 to 9 as evidenced by the electrophoretic mobility; (B) anionic phosphate dispersing agents; and (C)...

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Bibliographische Detailangaben

Hauptverfasser:	CHU, JEA-JU, LI, YUZHUO, VENKATARAMAN, SHYAM SUNDAR, USMAN IBRAHIM, SHEIK ANSAR, PINDER, HARVEY WAYNE
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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