POST-CMP CLEANING BRUSH

Embodiments of the invention include a CMP brush that has a combination of central nodules at an inner region of the brush and one or more edge nodules at an end region of the brush where the central nodules and edge nodules are in a staggered or matched arrangement with each other and an upper surf...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MCNAMARA, ERIC, SINGH, RAKESH, WARGO, CHRISTOPHER, TRIO, DAVID
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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