LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
A lithographic projection apparatus comprises an exposure system and a measurement system. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movab...
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| creator | FIEN, MENNO BREUKERS, MARCUS JOSEPH ELISABETH GODFRIED HOUKES, MARTIJN VAN DONKELAAR, EDWIN TEUNIS CUIJPERS, MARTINUS AGNES WILLEM DRAAIJER, EVERT HENDRIK JAN |
| description | A lithographic projection apparatus comprises an exposure system and a measurement system. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_SG138458A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>SG138458A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_SG138458A13</originalsourceid><addsrcrecordid>eNrjZDDz8Qzx8HcPcgzw8HRWcAwIcAxyDAkNVnD0c1FwcQ3zdHZV8HX0C3VzdA4JDfL0c1fwdQWqd-FhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfHB7obGFiamFo6GxoRVAACLXidO</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><source>esp@cenet</source><creator>FIEN, MENNO ; BREUKERS, MARCUS JOSEPH ELISABETH GODFRIED ; HOUKES, MARTIJN ; VAN DONKELAAR, EDWIN TEUNIS ; CUIJPERS, MARTINUS AGNES WILLEM ; DRAAIJER, EVERT HENDRIK JAN</creator><creatorcontrib>FIEN, MENNO ; BREUKERS, MARCUS JOSEPH ELISABETH GODFRIED ; HOUKES, MARTIJN ; VAN DONKELAAR, EDWIN TEUNIS ; CUIJPERS, MARTINUS AGNES WILLEM ; DRAAIJER, EVERT HENDRIK JAN</creatorcontrib><description>A lithographic projection apparatus comprises an exposure system and a measurement system. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080128&DB=EPODOC&CC=SG&NR=138458A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080128&DB=EPODOC&CC=SG&NR=138458A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FIEN, MENNO</creatorcontrib><creatorcontrib>BREUKERS, MARCUS JOSEPH ELISABETH GODFRIED</creatorcontrib><creatorcontrib>HOUKES, MARTIJN</creatorcontrib><creatorcontrib>VAN DONKELAAR, EDWIN TEUNIS</creatorcontrib><creatorcontrib>CUIJPERS, MARTINUS AGNES WILLEM</creatorcontrib><creatorcontrib>DRAAIJER, EVERT HENDRIK JAN</creatorcontrib><title>LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><description>A lithographic projection apparatus comprises an exposure system and a measurement system. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDDz8Qzx8HcPcgzw8HRWcAwIcAxyDAkNVnD0c1FwcQ3zdHZV8HX0C3VzdA4JDfL0c1fwdQWqd-FhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfHB7obGFiamFo6GxoRVAACLXidO</recordid><startdate>20080128</startdate><enddate>20080128</enddate><creator>FIEN, MENNO</creator><creator>BREUKERS, MARCUS JOSEPH ELISABETH GODFRIED</creator><creator>HOUKES, MARTIJN</creator><creator>VAN DONKELAAR, EDWIN TEUNIS</creator><creator>CUIJPERS, MARTINUS AGNES WILLEM</creator><creator>DRAAIJER, EVERT HENDRIK JAN</creator><scope>EVB</scope></search><sort><creationdate>20080128</creationdate><title>LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><author>FIEN, MENNO ; BREUKERS, MARCUS JOSEPH ELISABETH GODFRIED ; HOUKES, MARTIJN ; VAN DONKELAAR, EDWIN TEUNIS ; CUIJPERS, MARTINUS AGNES WILLEM ; DRAAIJER, EVERT HENDRIK JAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_SG138458A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>FIEN, MENNO</creatorcontrib><creatorcontrib>BREUKERS, MARCUS JOSEPH ELISABETH GODFRIED</creatorcontrib><creatorcontrib>HOUKES, MARTIJN</creatorcontrib><creatorcontrib>VAN DONKELAAR, EDWIN TEUNIS</creatorcontrib><creatorcontrib>CUIJPERS, MARTINUS AGNES WILLEM</creatorcontrib><creatorcontrib>DRAAIJER, EVERT HENDRIK JAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FIEN, MENNO</au><au>BREUKERS, MARCUS JOSEPH ELISABETH GODFRIED</au><au>HOUKES, MARTIJN</au><au>VAN DONKELAAR, EDWIN TEUNIS</au><au>CUIJPERS, MARTINUS AGNES WILLEM</au><au>DRAAIJER, EVERT HENDRIK JAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD</title><date>2008-01-28</date><risdate>2008</risdate><abstract>A lithographic projection apparatus comprises an exposure system and a measurement system. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
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