CHEMICAL VAPOR DEPOSITION APPARATUS AND METHODS OF USING THE APPARATUS
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| creator | LEWIS, DANIEL JOSEPH LOU, VICTOR LIENKONG SAYLOR, MATTHEW DAVID DALAKOS, GEORGE THEODORE WEAVER, SCOTT ANDREW RUCKER, MICHAEL HOWARD |
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| language | eng |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | CHEMICAL VAPOR DEPOSITION APPARATUS AND METHODS OF USING THE APPARATUS |
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