PROCESSING SYSTEMS AND PLATFORMS FOR ROUGHNESS REDUCTION OF MATERIALS USING ILLUMINATED ETCH SOLUTIONS

Processing system and platform embodiments are described that illuminate etch solutions to provide controlled etching of materials. The processing systems and platforms deposit a liquid etch solution over a material to be etched and illuminate the liquid etch solution to adjust levels of reactants....

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: FAGUET, Jacques, ZANDI, Omid
Format: Patent
Sprache:eng
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