STAINLESS STEEL MEMBER AND PRODUCTION METHOD THEREOF
The purpose of the present invention is to provide a stainless steel member and a production method thereof, said stainless steel member having a passivation layer formed on a surface of a base material formed from stainless steel, wherein the film thickness of the passivation layer is 2-20 nm, and...
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creator | NAKAMURA Yumiko SERA Akira NAKATANI Michihito |
description | The purpose of the present invention is to provide a stainless steel member and a production method thereof, said stainless steel member having a passivation layer formed on a surface of a base material formed from stainless steel, wherein the film thickness of the passivation layer is 2-20 nm, and the concentration of chromium atoms in the outermost surface of the passivation layer is 0.1-2.3 by atomic percentage. Also provided are a device or container, the liquid-contact part of which in contact with a semiconductor treatment liquid is formed from the stainless steel member, a semiconductor treatment liquid production method for producing the semiconductor treatment liquid by using the device, and a semiconductor treatment liquid storage method for storing the semiconductor treatment liquid in the container. |
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Also provided are a device or container, the liquid-contact part of which in contact with a semiconductor treatment liquid is formed from the stainless steel member, a semiconductor treatment liquid production method for producing the semiconductor treatment liquid by using the device, and a semiconductor treatment liquid storage method for storing the semiconductor treatment liquid in the container.</description><language>eng</language><subject>APPARATUS THEREFOR ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200929&DB=EPODOC&CC=SG&NR=11202008033RA$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25566,76549</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200929&DB=EPODOC&CC=SG&NR=11202008033RA$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NAKAMURA Yumiko</creatorcontrib><creatorcontrib>SERA Akira</creatorcontrib><creatorcontrib>NAKATANI Michihito</creatorcontrib><title>STAINLESS STEEL MEMBER AND PRODUCTION METHOD THEREOF</title><description>The purpose of the present invention is to provide a stainless steel member and a production method thereof, said stainless steel member having a passivation layer formed on a surface of a base material formed from stainless steel, wherein the film thickness of the passivation layer is 2-20 nm, and the concentration of chromium atoms in the outermost surface of the passivation layer is 0.1-2.3 by atomic percentage. Also provided are a device or container, the liquid-contact part of which in contact with a semiconductor treatment liquid is formed from the stainless steel member, a semiconductor treatment liquid production method for producing the semiconductor treatment liquid by using the device, and a semiconductor treatment liquid storage method for storing the semiconductor treatment liquid in the container.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAJDnH09PNxDQ5WCA5xdfVR8HX1dXINUnD0c1EICPJ3CXUO8fT3A4qGePi7KIR4uAa5-rvxMLCmJeYUp_JCaW4GFTfXEGcP3dSC_PjU4oLE5NS81JL4YHdDQyMDIwMDCwNj4yBHYyKVAQC7VCjS</recordid><startdate>20200929</startdate><enddate>20200929</enddate><creator>NAKAMURA Yumiko</creator><creator>SERA Akira</creator><creator>NAKATANI Michihito</creator><scope>EVB</scope></search><sort><creationdate>20200929</creationdate><title>STAINLESS STEEL MEMBER AND PRODUCTION METHOD THEREOF</title><author>NAKAMURA Yumiko ; SERA Akira ; NAKATANI Michihito</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_SG11202008033RA3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>NAKAMURA Yumiko</creatorcontrib><creatorcontrib>SERA Akira</creatorcontrib><creatorcontrib>NAKATANI Michihito</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NAKAMURA Yumiko</au><au>SERA Akira</au><au>NAKATANI Michihito</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>STAINLESS STEEL MEMBER AND PRODUCTION METHOD THEREOF</title><date>2020-09-29</date><risdate>2020</risdate><abstract>The purpose of the present invention is to provide a stainless steel member and a production method thereof, said stainless steel member having a passivation layer formed on a surface of a base material formed from stainless steel, wherein the film thickness of the passivation layer is 2-20 nm, and the concentration of chromium atoms in the outermost surface of the passivation layer is 0.1-2.3 by atomic percentage. Also provided are a device or container, the liquid-contact part of which in contact with a semiconductor treatment liquid is formed from the stainless steel member, a semiconductor treatment liquid production method for producing the semiconductor treatment liquid by using the device, and a semiconductor treatment liquid storage method for storing the semiconductor treatment liquid in the container.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | STAINLESS STEEL MEMBER AND PRODUCTION METHOD THEREOF |
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