Fe-Pt-OXIDE-BN-BASED SINTERED COMPACT FOR SPUTTERING TARGET

The Fe-Pt-oxide-BN-based sintered compact for a sputtering target has a mass ratio of N to B (N/B) in a range of 1.30±0.1.

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Hauptverfasser: KOBAYASHI, Hironori, NISHIURA, Masahiro, YAMAMOTO, Takamichi, MIYASHITA, Takanobu, KUROSE, Kenta
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creator KOBAYASHI, Hironori
NISHIURA, Masahiro
YAMAMOTO, Takamichi
MIYASHITA, Takanobu
KUROSE, Kenta
description The Fe-Pt-oxide-BN-based sintered compact for a sputtering target has a mass ratio of N to B (N/B) in a range of 1.30±0.1.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_SG11202007698TA</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>SG11202007698TA</sourcerecordid><originalsourceid>FETCH-epo_espacenet_SG11202007698TA3</originalsourceid><addsrcrecordid>eNrjZLB2S9UNKNH1j_B0cdV18tN1cgx2dVEI9vQLcQ0CMpz9fQMcnUMU3PyDFIIDQkOAop5-7gohjkHuriE8DKxpiTnFqbxQmptBxc01xNlDN7UgPz61uCAxOTUvtSQ-2N3Q0MjAyMDA3MzSIsTRmEhlAOxBKv0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Fe-Pt-OXIDE-BN-BASED SINTERED COMPACT FOR SPUTTERING TARGET</title><source>esp@cenet</source><creator>KOBAYASHI, Hironori ; NISHIURA, Masahiro ; YAMAMOTO, Takamichi ; MIYASHITA, Takanobu ; KUROSE, Kenta</creator><creatorcontrib>KOBAYASHI, Hironori ; NISHIURA, Masahiro ; YAMAMOTO, Takamichi ; MIYASHITA, Takanobu ; KUROSE, Kenta</creatorcontrib><description>The Fe-Pt-oxide-BN-based sintered compact for a sputtering target has a mass ratio of N to B (N/B) in a range of 1.30±0.1.</description><language>eng</language><subject>ALLOYS ; CASTING ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; FERROUS OR NON-FERROUS ALLOYS ; INFORMATION STORAGE ; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MAKING METALLIC POWDER ; MANUFACTURE OF ARTICLES FROM METALLIC POWDER ; METALLURGY ; PERFORMING OPERATIONS ; PHYSICS ; POWDER METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING ; TREATMENT OF ALLOYS OR NON-FERROUS METALS ; WORKING METALLIC POWDER</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201230&amp;DB=EPODOC&amp;CC=SG&amp;NR=11202007698TA$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20201230&amp;DB=EPODOC&amp;CC=SG&amp;NR=11202007698TA$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KOBAYASHI, Hironori</creatorcontrib><creatorcontrib>NISHIURA, Masahiro</creatorcontrib><creatorcontrib>YAMAMOTO, Takamichi</creatorcontrib><creatorcontrib>MIYASHITA, Takanobu</creatorcontrib><creatorcontrib>KUROSE, Kenta</creatorcontrib><title>Fe-Pt-OXIDE-BN-BASED SINTERED COMPACT FOR SPUTTERING TARGET</title><description>The Fe-Pt-oxide-BN-based sintered compact for a sputtering target has a mass ratio of N to B (N/B) in a range of 1.30±0.1.</description><subject>ALLOYS</subject><subject>CASTING</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>FERROUS OR NON-FERROUS ALLOYS</subject><subject>INFORMATION STORAGE</subject><subject>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MAKING METALLIC POWDER</subject><subject>MANUFACTURE OF ARTICLES FROM METALLIC POWDER</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>POWDER METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><subject>TREATMENT OF ALLOYS OR NON-FERROUS METALS</subject><subject>WORKING METALLIC POWDER</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLB2S9UNKNH1j_B0cdV18tN1cgx2dVEI9vQLcQ0CMpz9fQMcnUMU3PyDFIIDQkOAop5-7gohjkHuriE8DKxpiTnFqbxQmptBxc01xNlDN7UgPz61uCAxOTUvtSQ-2N3Q0MjAyMDA3MzSIsTRmEhlAOxBKv0</recordid><startdate>20201230</startdate><enddate>20201230</enddate><creator>KOBAYASHI, Hironori</creator><creator>NISHIURA, Masahiro</creator><creator>YAMAMOTO, Takamichi</creator><creator>MIYASHITA, Takanobu</creator><creator>KUROSE, Kenta</creator><scope>EVB</scope></search><sort><creationdate>20201230</creationdate><title>Fe-Pt-OXIDE-BN-BASED SINTERED COMPACT FOR SPUTTERING TARGET</title><author>KOBAYASHI, Hironori ; NISHIURA, Masahiro ; YAMAMOTO, Takamichi ; MIYASHITA, Takanobu ; KUROSE, Kenta</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_SG11202007698TA3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2020</creationdate><topic>ALLOYS</topic><topic>CASTING</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>FERROUS OR NON-FERROUS ALLOYS</topic><topic>INFORMATION STORAGE</topic><topic>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MAKING METALLIC POWDER</topic><topic>MANUFACTURE OF ARTICLES FROM METALLIC POWDER</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>POWDER METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><topic>TREATMENT OF ALLOYS OR NON-FERROUS METALS</topic><topic>WORKING METALLIC POWDER</topic><toplevel>online_resources</toplevel><creatorcontrib>KOBAYASHI, Hironori</creatorcontrib><creatorcontrib>NISHIURA, Masahiro</creatorcontrib><creatorcontrib>YAMAMOTO, Takamichi</creatorcontrib><creatorcontrib>MIYASHITA, Takanobu</creatorcontrib><creatorcontrib>KUROSE, Kenta</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KOBAYASHI, Hironori</au><au>NISHIURA, Masahiro</au><au>YAMAMOTO, Takamichi</au><au>MIYASHITA, Takanobu</au><au>KUROSE, Kenta</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Fe-Pt-OXIDE-BN-BASED SINTERED COMPACT FOR SPUTTERING TARGET</title><date>2020-12-30</date><risdate>2020</risdate><abstract>The Fe-Pt-oxide-BN-based sintered compact for a sputtering target has a mass ratio of N to B (N/B) in a range of 1.30±0.1.</abstract><oa>free_for_read</oa></addata></record>
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source esp@cenet
subjects ALLOYS
CASTING
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
FERROUS OR NON-FERROUS ALLOYS
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
MAKING METALLIC POWDER
MANUFACTURE OF ARTICLES FROM METALLIC POWDER
METALLURGY
PERFORMING OPERATIONS
PHYSICS
POWDER METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TRANSPORTING
TREATMENT OF ALLOYS OR NON-FERROUS METALS
WORKING METALLIC POWDER
title Fe-Pt-OXIDE-BN-BASED SINTERED COMPACT FOR SPUTTERING TARGET
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-07T04%3A16%3A08IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KOBAYASHI,%20Hironori&rft.date=2020-12-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ESG11202007698TA%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true