CHAMBER COMPONENTS FOR EPITAXIAL GROWTH APPARATUS
CHAMBER COMPONENTS FOR EPITAXIAL GROWTH APPARATUS Chamber components for an epitaxial growth apparatus are disclosed. A reaction chamber defined and formed by a ceiling plate. A reactant gas is rectified in a reactant gas supply path disposed in the side wall, so that a horizontal component in a flo...
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| Format: | Patent |
| Sprache: | eng |
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