PHOTORESIST STRIPPER
PHOTORESIST STRIPPER Improved stripper solutions for removing photoresists from substrates are provided that typically have flash points above about 0 0 and high loading capacities. The stripper solutions comprise diethylene glycol butyl ether, quaternary ammonium hydroxide, and an alkanolamine havi...
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| Format: | Patent |
| Sprache: | eng |
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