EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM HAVING CHUCK ASSEMBLY AND METHOD OF MANUFACTURING THEREOF
EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM HAVING CHUCK ASSEMBLY AND METHOD OF MANUFACTURING THEREOF An EUV lithography system and method of manufacturing thereof includes: an EUV light source; a chuck being thermally conducting and smooth having a surface with a predetermined chuck flatness; and a refl...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM HAVING CHUCK ASSEMBLY AND METHOD OF MANUFACTURING THEREOF An EUV lithography system and method of manufacturing thereof includes: an EUV light source; a chuck being thermally conducting and smooth having a surface with a predetermined chuck flatness; and a reflective lens system for directing EUV light from the EUV light source over the surface of the chuck. FIG. 2 |
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