Method For Dressing Polishing Pads

A method dresses one polishing cloth or two polishing pads simultaneously, in which a polishing cloth has been applied to a polishing plate, with at least one dresser (4), which is equipped with at least one dressing element (8), this at least one dressing element (8) being in contact with the at le...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SCHNAPPAUF, MARKUS, OLBRICH, TORSTEN, DUTSCHKE, VLADIMIR, MISTUR, LESZEK
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator SCHNAPPAUF, MARKUS
OLBRICH, TORSTEN
DUTSCHKE, VLADIMIR
MISTUR, LESZEK
description A method dresses one polishing cloth or two polishing pads simultaneously, in which a polishing cloth has been applied to a polishing plate, with at least one dresser (4), which is equipped with at least one dressing element (8), this at least one dressing element (8) being in contact with the at least one polishing cloth (11, 12) to be dressed, wherein the at least one polishing plate (21, 22) is rotated with a relative rotational speed and the at least one dresser (4) is rotated with a relative rotational speed and at least two different combinations of directions of rotation of the two pairs of polishing plates (21, 22) and pin wheels (31, 32) are executed during the simultaneous dressing of two polishing pads (11, 12) or during the dressing of one polishing cloth (11) of the polishing plate (21) and of the at least one dresser (4).
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_SG10201600213YA</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>SG10201600213YA</sourcerecordid><originalsourceid>FETCH-epo_espacenet_SG10201600213YA3</originalsourceid><addsrcrecordid>eNrjZFDyTS3JyE9RcMsvUnApSi0uzsxLVwjIz8kszgCzElOKeRhY0xJzilN5oTQ3g4qba4izh25qQX58anFBYnJqXmpJfLC7oYGRgaGZgYGRoXGkozGRygBcyibv</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method For Dressing Polishing Pads</title><source>esp@cenet</source><creator>SCHNAPPAUF, MARKUS ; OLBRICH, TORSTEN ; DUTSCHKE, VLADIMIR ; MISTUR, LESZEK</creator><creatorcontrib>SCHNAPPAUF, MARKUS ; OLBRICH, TORSTEN ; DUTSCHKE, VLADIMIR ; MISTUR, LESZEK</creatorcontrib><description>A method dresses one polishing cloth or two polishing pads simultaneously, in which a polishing cloth has been applied to a polishing plate, with at least one dresser (4), which is equipped with at least one dressing element (8), this at least one dressing element (8) being in contact with the at least one polishing cloth (11, 12) to be dressed, wherein the at least one polishing plate (21, 22) is rotated with a relative rotational speed and the at least one dresser (4) is rotated with a relative rotational speed and at least two different combinations of directions of rotation of the two pairs of polishing plates (21, 22) and pin wheels (31, 32) are executed during the simultaneous dressing of two polishing pads (11, 12) or during the dressing of one polishing cloth (11) of the polishing plate (21) and of the at least one dresser (4).</description><language>eng</language><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20160830&amp;DB=EPODOC&amp;CC=SG&amp;NR=10201600213YA$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20160830&amp;DB=EPODOC&amp;CC=SG&amp;NR=10201600213YA$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHNAPPAUF, MARKUS</creatorcontrib><creatorcontrib>OLBRICH, TORSTEN</creatorcontrib><creatorcontrib>DUTSCHKE, VLADIMIR</creatorcontrib><creatorcontrib>MISTUR, LESZEK</creatorcontrib><title>Method For Dressing Polishing Pads</title><description>A method dresses one polishing cloth or two polishing pads simultaneously, in which a polishing cloth has been applied to a polishing plate, with at least one dresser (4), which is equipped with at least one dressing element (8), this at least one dressing element (8) being in contact with the at least one polishing cloth (11, 12) to be dressed, wherein the at least one polishing plate (21, 22) is rotated with a relative rotational speed and the at least one dresser (4) is rotated with a relative rotational speed and at least two different combinations of directions of rotation of the two pairs of polishing plates (21, 22) and pin wheels (31, 32) are executed during the simultaneous dressing of two polishing pads (11, 12) or during the dressing of one polishing cloth (11) of the polishing plate (21) and of the at least one dresser (4).</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFDyTS3JyE9RcMsvUnApSi0uzsxLVwjIz8kszgCzElOKeRhY0xJzilN5oTQ3g4qba4izh25qQX58anFBYnJqXmpJfLC7oYGRgaGZgYGRoXGkozGRygBcyibv</recordid><startdate>20160830</startdate><enddate>20160830</enddate><creator>SCHNAPPAUF, MARKUS</creator><creator>OLBRICH, TORSTEN</creator><creator>DUTSCHKE, VLADIMIR</creator><creator>MISTUR, LESZEK</creator><scope>EVB</scope></search><sort><creationdate>20160830</creationdate><title>Method For Dressing Polishing Pads</title><author>SCHNAPPAUF, MARKUS ; OLBRICH, TORSTEN ; DUTSCHKE, VLADIMIR ; MISTUR, LESZEK</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_SG10201600213YA3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><toplevel>online_resources</toplevel><creatorcontrib>SCHNAPPAUF, MARKUS</creatorcontrib><creatorcontrib>OLBRICH, TORSTEN</creatorcontrib><creatorcontrib>DUTSCHKE, VLADIMIR</creatorcontrib><creatorcontrib>MISTUR, LESZEK</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHNAPPAUF, MARKUS</au><au>OLBRICH, TORSTEN</au><au>DUTSCHKE, VLADIMIR</au><au>MISTUR, LESZEK</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method For Dressing Polishing Pads</title><date>2016-08-30</date><risdate>2016</risdate><abstract>A method dresses one polishing cloth or two polishing pads simultaneously, in which a polishing cloth has been applied to a polishing plate, with at least one dresser (4), which is equipped with at least one dressing element (8), this at least one dressing element (8) being in contact with the at least one polishing cloth (11, 12) to be dressed, wherein the at least one polishing plate (21, 22) is rotated with a relative rotational speed and the at least one dresser (4) is rotated with a relative rotational speed and at least two different combinations of directions of rotation of the two pairs of polishing plates (21, 22) and pin wheels (31, 32) are executed during the simultaneous dressing of two polishing pads (11, 12) or during the dressing of one polishing cloth (11) of the polishing plate (21) and of the at least one dresser (4).</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_SG10201600213YA
source esp@cenet
title Method For Dressing Polishing Pads
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T08%3A32%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SCHNAPPAUF,%20MARKUS&rft.date=2016-08-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ESG10201600213YA%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true