METHOD FOR CLEANING SOLID SURFACE FROM MICROPARTICLES

FIELD: technological processes.SUBSTANCE: invention relates to the methods for cleaning hard surfaces from microparticles and can be used in order to remove microparticles from the surface of semiconductor wafers, as well as in space optics, high-resolution optics, photonics. Layer of the solution o...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Tarasov Oleg Aleksandrovich, Ivanova Natalya Anatolevna
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	CLEANING CLEANING IN GENERAL PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING
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