METAL PLASMA SOURCE (VERSIONS)

FIELD: technological processes.SUBSTANCE: metal plasma source (MPS) comprises cooled cathode made of the evaporated metal installed in the vacuum chamber, anode in the form of vertical plates, and power supply connected with anode and cathode by current leads. MPS has screens and ion current sensors...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Tagirov Gleb Evgenevich, Batin Dmitrij Petrovich, Naumenko Mikhail JUrevich, SHadrin Dmitrij Borisovich
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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