METHOD OF PRODUCING THIN METALLIC FILMS

FIELD: coating materials. ^ SUBSTANCE: method comprises applying a noble metal layer on the plates made of monocrystalline silicon and separating the layer from the substrate. The monocrystalline silicon is oxidized before the applying of the film. The film is applied by physical or chemical settlin...

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Bibliographische Detailangaben
Hauptverfasser:	VJATKIN ANATOLIJ FEDOROVICH, VOLKOV VLADIMIR TIMOFEEVICH, STARKOV VITALIJ VASIL'EVICH
Format:	Patent
Sprache:	eng ; rus
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	FIELD: coating materials. ^ SUBSTANCE: method comprises applying a noble metal layer on the plates made of monocrystalline silicon and separating the layer from the substrate. The monocrystalline silicon is oxidized before the applying of the film. The film is applied by physical or chemical settling. The film is separated from the substrate by complete or partial dissolving of the substrate in floating solution. On dissolving the substrate, the metallic film is set on the surface of the floating solution or set in the other liquid to provide complete elevation of the metallic film by the surface tension. ^ EFFECT: simplified method. ^ 4 cl, 7 ex