DEVICE FOR TREATMENT OF SEWAGE
FIELD: cleaning chromium-containing waste water at circulating water supply; mining, chemical and other industries. SUBSTANCE: proposed device may be used for cleaning waste water of galvanic process from heavy metals and organic agents; cleaning oil-and-scale- containing waste water and arsenic-con...
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Format: | Patent |
Sprache: | eng ; rus |
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Zusammenfassung: | FIELD: cleaning chromium-containing waste water at circulating water supply; mining, chemical and other industries. SUBSTANCE: proposed device may be used for cleaning waste water of galvanic process from heavy metals and organic agents; cleaning oil-and-scale- containing waste water and arsenic-containing solutions. Device has perforated reservoir filled with galvanic couple, branch pipes for delivery of waste water and discharge of cleaned water; device has pair number of perforated reservoirs 1 filled with galvanic couple and secured on revolving disk 2 for contact with waste water, guide plates 7 and stops 8 secured on shaft for deflection of reservoirs from vertical axis to opposite sides through angle alpha no less than 35-45 deg. ; device is also provided with chamber for delivery of dispersed air and perforated receiver for sludge escaping from reservoirs. Disk is set in rotation by means of hydraulic drive by filling buckets secured on disk rim with water; buckets are placed in closed casing provided with water discharge branch pipe. Secured as cantilever on opposite side of shaft of revolving disk are driven disks on which pair number of perforated reservoirs is secured. Secured on bottom of each perforated reservoir is tray and stop perpendicular to shaft axis for immersion of reservoirs in waste water by 3/4 of height. Radius of rotation exceeds height of immersed reservoirs by three times at their number of 2, 4, 6 and 8. Proposed device may use galvanic couples of different types at effective control of electrochemical and mass- exchange processes at change in concentration of admixtures and duration of contact of galvanic couple with solution through change of rotational speed of disk, removal of sludge and dehydration of galvanic couple. EFFECT: enhanced intensification of continuous cleaning process. 5 cl, 2 dwg |
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