METHOD OF APPLYING SILICON NITRIDE-BASED COATING ON GLASS, IN PARTICULAR, QUARTZ, SURFACE

METHOD OF APPLYING SILICON NITRIDE-BASED COATING ON GLASS, IN PARTICULAR, QUARTZ, SURFACE

FIELD: coatings for glassware. SUBSTANCE: invention aims at preventing liquid silicon from dissolution in crucible body resulting in destruction of the latter because of difference in thermal expansion coefficients. Coating is applied by thermal deposition of silicon in vacuum chamber under nitrogen...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BOVBEL' E.V, VAL'DNER V.O, STAROSTIN E.E, TERESHIN S.A, SHIRJAEV A.V, EPIFANOVSKIJ I.S, ZABOLOTNYJ V.T, RUDNIK S.D
Format: Patent
Sprache:eng ; rus
Schlagworte:
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS
CHEMISTRY
GLASS
JOINING GLASS TO GLASS OR OTHER MATERIALS
METALLURGY
MINERAL OR SLAG WOOL
SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS
SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:FIELD: coatings for glassware. SUBSTANCE: invention aims at preventing liquid silicon from dissolution in crucible body resulting in destruction of the latter because of difference in thermal expansion coefficients. Coating is applied by thermal deposition of silicon in vacuum chamber under nitrogen atmosphere at 10 Torr pressure while simultaneously inducing silicon nitride synthesis by irradiation of layer being deposited with low-energy nitrogen ions with energy up to 10 keV, ion current density up to 50 mcA/sq.cm, and substrate temperature up to 700K. EFFECT: achieved formation of poreless release coating on crucible surfaces.