POSITIVE THERMOSTABLE PHOTORESIST MATERIAL
Gespeichert in:
| Hauptverfasser: | , , , , , , , , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; rus |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | CHIKIRISOVA TATYANA N SKORNYAKOVA OLGA I DUDARCHIK ANATOLIJ I MARINCHENKO TATYANA T KAZARTSEVA LARISA A ABRAMOVICH VILYA SH CHALTSEVA TATYANA V KABANOVA ELEONORA A SHUMILKINA NATALIYA V LADUTKO NATALIYA V ASKEROV DZHAMIDIN B SERDYUK OLGA A ERLIKH ROALD D SAKHAROVA NATALIYA A KRUPEN EVGENIJ V CHELUSHKIN BORIS S |
| description | |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_RU1825425C</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>RU1825425C</sourcerecordid><originalsourceid>FETCH-epo_espacenet_RU1825425C3</originalsourceid><addsrcrecordid>eNrjZNAK8A_2DPEMc1UI8XAN8vUPDnF08nFVCPDwD_EPcg32DA5R8HUMcQ3ydPThYWBNS8wpTuWF0twM8m6uIc4euqkF-fGpxQWJyal5qSXxQaGGFkamJkamzsaEVQAAAK4kgw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>POSITIVE THERMOSTABLE PHOTORESIST MATERIAL</title><source>esp@cenet</source><creator>CHIKIRISOVA TATYANA N ; SKORNYAKOVA OLGA I ; DUDARCHIK ANATOLIJ I ; MARINCHENKO TATYANA T ; KAZARTSEVA LARISA A ; ABRAMOVICH VILYA SH ; CHALTSEVA TATYANA V ; KABANOVA ELEONORA A ; SHUMILKINA NATALIYA V ; LADUTKO NATALIYA V ; ASKEROV DZHAMIDIN B ; SERDYUK OLGA A ; ERLIKH ROALD D ; SAKHAROVA NATALIYA A ; KRUPEN EVGENIJ V ; CHELUSHKIN BORIS S</creator><creatorcontrib>CHIKIRISOVA TATYANA N ; SKORNYAKOVA OLGA I ; DUDARCHIK ANATOLIJ I ; MARINCHENKO TATYANA T ; KAZARTSEVA LARISA A ; ABRAMOVICH VILYA SH ; CHALTSEVA TATYANA V ; KABANOVA ELEONORA A ; SHUMILKINA NATALIYA V ; LADUTKO NATALIYA V ; ASKEROV DZHAMIDIN B ; SERDYUK OLGA A ; ERLIKH ROALD D ; SAKHAROVA NATALIYA A ; KRUPEN EVGENIJ V ; CHELUSHKIN BORIS S</creatorcontrib><edition>5</edition><language>eng ; rus</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>1993</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930630&DB=EPODOC&CC=RU&NR=1825425C$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930630&DB=EPODOC&CC=RU&NR=1825425C$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHIKIRISOVA TATYANA N</creatorcontrib><creatorcontrib>SKORNYAKOVA OLGA I</creatorcontrib><creatorcontrib>DUDARCHIK ANATOLIJ I</creatorcontrib><creatorcontrib>MARINCHENKO TATYANA T</creatorcontrib><creatorcontrib>KAZARTSEVA LARISA A</creatorcontrib><creatorcontrib>ABRAMOVICH VILYA SH</creatorcontrib><creatorcontrib>CHALTSEVA TATYANA V</creatorcontrib><creatorcontrib>KABANOVA ELEONORA A</creatorcontrib><creatorcontrib>SHUMILKINA NATALIYA V</creatorcontrib><creatorcontrib>LADUTKO NATALIYA V</creatorcontrib><creatorcontrib>ASKEROV DZHAMIDIN B</creatorcontrib><creatorcontrib>SERDYUK OLGA A</creatorcontrib><creatorcontrib>ERLIKH ROALD D</creatorcontrib><creatorcontrib>SAKHAROVA NATALIYA A</creatorcontrib><creatorcontrib>KRUPEN EVGENIJ V</creatorcontrib><creatorcontrib>CHELUSHKIN BORIS S</creatorcontrib><title>POSITIVE THERMOSTABLE PHOTORESIST MATERIAL</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1993</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAK8A_2DPEMc1UI8XAN8vUPDnF08nFVCPDwD_EPcg32DA5R8HUMcQ3ydPThYWBNS8wpTuWF0twM8m6uIc4euqkF-fGpxQWJyal5qSXxQaGGFkamJkamzsaEVQAAAK4kgw</recordid><startdate>19930630</startdate><enddate>19930630</enddate><creator>CHIKIRISOVA TATYANA N</creator><creator>SKORNYAKOVA OLGA I</creator><creator>DUDARCHIK ANATOLIJ I</creator><creator>MARINCHENKO TATYANA T</creator><creator>KAZARTSEVA LARISA A</creator><creator>ABRAMOVICH VILYA SH</creator><creator>CHALTSEVA TATYANA V</creator><creator>KABANOVA ELEONORA A</creator><creator>SHUMILKINA NATALIYA V</creator><creator>LADUTKO NATALIYA V</creator><creator>ASKEROV DZHAMIDIN B</creator><creator>SERDYUK OLGA A</creator><creator>ERLIKH ROALD D</creator><creator>SAKHAROVA NATALIYA A</creator><creator>KRUPEN EVGENIJ V</creator><creator>CHELUSHKIN BORIS S</creator><scope>EVB</scope></search><sort><creationdate>19930630</creationdate><title>POSITIVE THERMOSTABLE PHOTORESIST MATERIAL</title><author>CHIKIRISOVA TATYANA N ; SKORNYAKOVA OLGA I ; DUDARCHIK ANATOLIJ I ; MARINCHENKO TATYANA T ; KAZARTSEVA LARISA A ; ABRAMOVICH VILYA SH ; CHALTSEVA TATYANA V ; KABANOVA ELEONORA A ; SHUMILKINA NATALIYA V ; LADUTKO NATALIYA V ; ASKEROV DZHAMIDIN B ; SERDYUK OLGA A ; ERLIKH ROALD D ; SAKHAROVA NATALIYA A ; KRUPEN EVGENIJ V ; CHELUSHKIN BORIS S</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_RU1825425C3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; rus</language><creationdate>1993</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>CHIKIRISOVA TATYANA N</creatorcontrib><creatorcontrib>SKORNYAKOVA OLGA I</creatorcontrib><creatorcontrib>DUDARCHIK ANATOLIJ I</creatorcontrib><creatorcontrib>MARINCHENKO TATYANA T</creatorcontrib><creatorcontrib>KAZARTSEVA LARISA A</creatorcontrib><creatorcontrib>ABRAMOVICH VILYA SH</creatorcontrib><creatorcontrib>CHALTSEVA TATYANA V</creatorcontrib><creatorcontrib>KABANOVA ELEONORA A</creatorcontrib><creatorcontrib>SHUMILKINA NATALIYA V</creatorcontrib><creatorcontrib>LADUTKO NATALIYA V</creatorcontrib><creatorcontrib>ASKEROV DZHAMIDIN B</creatorcontrib><creatorcontrib>SERDYUK OLGA A</creatorcontrib><creatorcontrib>ERLIKH ROALD D</creatorcontrib><creatorcontrib>SAKHAROVA NATALIYA A</creatorcontrib><creatorcontrib>KRUPEN EVGENIJ V</creatorcontrib><creatorcontrib>CHELUSHKIN BORIS S</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHIKIRISOVA TATYANA N</au><au>SKORNYAKOVA OLGA I</au><au>DUDARCHIK ANATOLIJ I</au><au>MARINCHENKO TATYANA T</au><au>KAZARTSEVA LARISA A</au><au>ABRAMOVICH VILYA SH</au><au>CHALTSEVA TATYANA V</au><au>KABANOVA ELEONORA A</au><au>SHUMILKINA NATALIYA V</au><au>LADUTKO NATALIYA V</au><au>ASKEROV DZHAMIDIN B</au><au>SERDYUK OLGA A</au><au>ERLIKH ROALD D</au><au>SAKHAROVA NATALIYA A</au><au>KRUPEN EVGENIJ V</au><au>CHELUSHKIN BORIS S</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POSITIVE THERMOSTABLE PHOTORESIST MATERIAL</title><date>1993-06-30</date><risdate>1993</risdate><edition>5</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; rus |
| recordid | cdi_epo_espacenet_RU1825425C |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | POSITIVE THERMOSTABLE PHOTORESIST MATERIAL |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T19%3A56%3A27IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CHIKIRISOVA%20TATYANA%20N&rft.date=1993-06-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ERU1825425C%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |