PROCEDE DE FABRICATION DE TELOMERES PHOTORETICULABLES
PCT No. PCT/FR82/00122 Sec. 371 Date Mar. 7, 1983 Sec. 102(e) Date Mar. 7, 1983 PCT Filed Jul. 20, 1982 PCT Pub. No. WO83/00336 PCT Pub. Date Feb. 3, 1983.Telomers and cotelomers with at least one sequence which can be cross-linked by light, and a method of preparing them. They are of the general fo...
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creator | MARC MALISZEWICZ YVES PIETRASANTA BERNARD BOUTEVIN WILLY-JEAN DEISS |
description | PCT No. PCT/FR82/00122 Sec. 371 Date Mar. 7, 1983 Sec. 102(e) Date Mar. 7, 1983 PCT Filed Jul. 20, 1982 PCT Pub. No. WO83/00336 PCT Pub. Date Feb. 3, 1983.Telomers and cotelomers with at least one sequence which can be cross-linked by light, and a method of preparing them. They are of the general formula wherein the taxogen links -(Xi)- belong to the group made up of 2-hydroxy ethyl acrylate and methacrylate, acrylic or methacrylic acid, vinyl alcohol and allyl alcohol; the links emanate from the same taxogen Xi, esterified by means of a group with at least one photo-crosslinkable double bond in its molecule; and where 1 |
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No. WO83/00336 PCT Pub. Date Feb. 3, 1983.Telomers and cotelomers with at least one sequence which can be cross-linked by light, and a method of preparing them. They are of the general formula wherein the taxogen links -(Xi)- belong to the group made up of 2-hydroxy ethyl acrylate and methacrylate, acrylic or methacrylic acid, vinyl alcohol and allyl alcohol; the links emanate from the same taxogen Xi, esterified by means of a group with at least one photo-crosslinkable double bond in its molecule; and where 1<x+y</=1000, Z being chosen form the group -H, -Cl, -Br; and where R may be a simple or macromolecular radical, in the latter case leading to the formation of dual sequence cotelomers. The manufacturing process comprises telomerization by redox or radical catalysis, followed by grafting on the photo-crosslinkable group, the first phase of telomerization being duplicated in the case of a cotelomer. The main application for the products is in coating metals.</description><language>fre</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC CHEMISTRY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>1982</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19820801&DB=EPODOC&CC=PT&NR=75282A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19820801&DB=EPODOC&CC=PT&NR=75282A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MARC MALISZEWICZ</creatorcontrib><creatorcontrib>YVES PIETRASANTA</creatorcontrib><creatorcontrib>BERNARD BOUTEVIN</creatorcontrib><creatorcontrib>WILLY-JEAN DEISS</creatorcontrib><title>PROCEDE DE FABRICATION DE TELOMERES PHOTORETICULABLES</title><description>PCT No. PCT/FR82/00122 Sec. 371 Date Mar. 7, 1983 Sec. 102(e) Date Mar. 7, 1983 PCT Filed Jul. 20, 1982 PCT Pub. No. WO83/00336 PCT Pub. Date Feb. 3, 1983.Telomers and cotelomers with at least one sequence which can be cross-linked by light, and a method of preparing them. They are of the general formula wherein the taxogen links -(Xi)- belong to the group made up of 2-hydroxy ethyl acrylate and methacrylate, acrylic or methacrylic acid, vinyl alcohol and allyl alcohol; the links emanate from the same taxogen Xi, esterified by means of a group with at least one photo-crosslinkable double bond in its molecule; and where 1<x+y</=1000, Z being chosen form the group -H, -Cl, -Br; and where R may be a simple or macromolecular radical, in the latter case leading to the formation of dual sequence cotelomers. The manufacturing process comprises telomerization by redox or radical catalysis, followed by grafting on the photo-crosslinkable group, the first phase of telomerization being duplicated in the case of a cotelomer. The main application for the products is in coating metals.</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1982</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDANCPJ3dnVxVQAiN0enIE9nxxBPfz8QN8TVx9_XNcg1WCHAwz_EP8g1xNM51MfRycc1mIeBNS0xpziVF0pzM8i6uYY4e-imFuTHpxYXJCan5qWWxAeEmJsaWRg5GhOSBwDANyY5</recordid><startdate>19820801</startdate><enddate>19820801</enddate><creator>MARC MALISZEWICZ</creator><creator>YVES PIETRASANTA</creator><creator>BERNARD BOUTEVIN</creator><creator>WILLY-JEAN DEISS</creator><scope>EVB</scope></search><sort><creationdate>19820801</creationdate><title>PROCEDE DE FABRICATION DE TELOMERES PHOTORETICULABLES</title><author>MARC MALISZEWICZ ; YVES PIETRASANTA ; BERNARD BOUTEVIN ; WILLY-JEAN DEISS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_PT75282A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>fre</language><creationdate>1982</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>MARC MALISZEWICZ</creatorcontrib><creatorcontrib>YVES PIETRASANTA</creatorcontrib><creatorcontrib>BERNARD BOUTEVIN</creatorcontrib><creatorcontrib>WILLY-JEAN DEISS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MARC MALISZEWICZ</au><au>YVES PIETRASANTA</au><au>BERNARD BOUTEVIN</au><au>WILLY-JEAN DEISS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROCEDE DE FABRICATION DE TELOMERES PHOTORETICULABLES</title><date>1982-08-01</date><risdate>1982</risdate><abstract>PCT No. PCT/FR82/00122 Sec. 371 Date Mar. 7, 1983 Sec. 102(e) Date Mar. 7, 1983 PCT Filed Jul. 20, 1982 PCT Pub. No. WO83/00336 PCT Pub. Date Feb. 3, 1983.Telomers and cotelomers with at least one sequence which can be cross-linked by light, and a method of preparing them. They are of the general formula wherein the taxogen links -(Xi)- belong to the group made up of 2-hydroxy ethyl acrylate and methacrylate, acrylic or methacrylic acid, vinyl alcohol and allyl alcohol; the links emanate from the same taxogen Xi, esterified by means of a group with at least one photo-crosslinkable double bond in its molecule; and where 1<x+y</=1000, Z being chosen form the group -H, -Cl, -Br; and where R may be a simple or macromolecular radical, in the latter case leading to the formation of dual sequence cotelomers. The manufacturing process comprises telomerization by redox or radical catalysis, followed by grafting on the photo-crosslinkable group, the first phase of telomerization being duplicated in the case of a cotelomer. The main application for the products is in coating metals.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
title | PROCEDE DE FABRICATION DE TELOMERES PHOTORETICULABLES |
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