Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same
Certain example embodiments relate to ultra-fast laser treatment of silver-inclusive (low-emissivity) low-E coatings, coated articles including such coatings, and/or associated methods. The low-E coating is formed on a substrate (e.g., borosilicate or soda lime silica glass), with the low-E coating...
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creator | Veerasamy, Victor Disteldorf, Bernd |
description | Certain example embodiments relate to ultra-fast laser treatment of silver-inclusive (low-emissivity) low-E coatings, coated articles including such coatings, and/or associated methods. The low-E coating is formed on a substrate (e.g., borosilicate or soda lime silica glass), with the low-E coating including at least one sputter-deposited silver-based layer, and with each said silver-based layer being sandwiched between one or more dielectric layers comprising one or more of zinc, nickel, chromium and titanium. The low-E coating is exposed to laser pulses having a duration of no more than 10-12 seconds, a wavelength of 355-500 nm, and a power density of more than 30 kW/cm2. The exposing is performed so as to avoid increasing temperature of the low-E coating to more than 300 degrees C while also reducing (a) grain boundaries with respect to, and vacancies in, each said silver-based layer, (b) each said silver-based layer's refractive index, and (c) emissivity of the low-E coating compared to its as-deposited form. |
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The low-E coating is formed on a substrate (e.g., borosilicate or soda lime silica glass), with the low-E coating including at least one sputter-deposited silver-based layer, and with each said silver-based layer being sandwiched between one or more dielectric layers comprising one or more of zinc, nickel, chromium and titanium. The low-E coating is exposed to laser pulses having a duration of no more than 10-12 seconds, a wavelength of 355-500 nm, and a power density of more than 30 kW/cm2. The exposing is performed so as to avoid increasing temperature of the low-E coating to more than 300 degrees C while also reducing (a) grain boundaries with respect to, and vacancies in, each said silver-based layer, (b) each said silver-based layer's refractive index, and (c) emissivity of the low-E coating compared to its as-deposited form.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DEVICES USING STIMULATED EMISSION ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRICITY ; GLASS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; JOINING GLASS TO GLASS OR OTHER MATERIALS ; METALLURGY ; MINERAL OR SLAG WOOL ; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS ; SURFACE TREATMENT OF GLASS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221125&DB=EPODOC&CC=NZ&NR=773387A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221125&DB=EPODOC&CC=NZ&NR=773387A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Veerasamy, Victor</creatorcontrib><creatorcontrib>Disteldorf, Bernd</creatorcontrib><title>Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same</title><description>Certain example embodiments relate to ultra-fast laser treatment of silver-inclusive (low-emissivity) low-E coatings, coated articles including such coatings, and/or associated methods. The low-E coating is formed on a substrate (e.g., borosilicate or soda lime silica glass), with the low-E coating including at least one sputter-deposited silver-based layer, and with each said silver-based layer being sandwiched between one or more dielectric layers comprising one or more of zinc, nickel, chromium and titanium. The low-E coating is exposed to laser pulses having a duration of no more than 10-12 seconds, a wavelength of 355-500 nm, and a power density of more than 30 kW/cm2. The exposing is performed so as to avoid increasing temperature of the low-E coating to more than 300 degrees C while also reducing (a) grain boundaries with respect to, and vacancies in, each said silver-based layer, (b) each said silver-based layer's refractive index, and (c) emissivity of the low-E coating compared to its as-deposited form.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>GLASS</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>JOINING GLASS TO GLASS OR OTHER MATERIALS</subject><subject>METALLURGY</subject><subject>MINERAL OR SLAG WOOL</subject><subject>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</subject><subject>SURFACE TREATMENT OF GLASS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqFjT0KwkAQhdNYiHoFmQO4WKSIrQTFysrKJgzZWTO4P2F3EsklPLNrsLd68N7H-5bFuw4opAGjcGsJ2Ld20OwfMFiJqAwmAYuJIkikGU1sR4pqJhOPlOcpz-zBhpcixym3LBNIlzvD1kGbJflzB-j1PkRwJF3QEAw4fH5l0hEkdLQuFgZtos0vV8X2fLrVF0V9aCj12JInaa73qirLQ3Us_wIfMGxNdw</recordid><startdate>20221125</startdate><enddate>20221125</enddate><creator>Veerasamy, Victor</creator><creator>Disteldorf, Bernd</creator><scope>EVB</scope></search><sort><creationdate>20221125</creationdate><title>Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same</title><author>Veerasamy, Victor ; Disteldorf, Bernd</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_NZ773387A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>GLASS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>JOINING GLASS TO GLASS OR OTHER MATERIALS</topic><topic>METALLURGY</topic><topic>MINERAL OR SLAG WOOL</topic><topic>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</topic><topic>SURFACE TREATMENT OF GLASS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>Veerasamy, Victor</creatorcontrib><creatorcontrib>Disteldorf, Bernd</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Veerasamy, Victor</au><au>Disteldorf, Bernd</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same</title><date>2022-11-25</date><risdate>2022</risdate><abstract>Certain example embodiments relate to ultra-fast laser treatment of silver-inclusive (low-emissivity) low-E coatings, coated articles including such coatings, and/or associated methods. The low-E coating is formed on a substrate (e.g., borosilicate or soda lime silica glass), with the low-E coating including at least one sputter-deposited silver-based layer, and with each said silver-based layer being sandwiched between one or more dielectric layers comprising one or more of zinc, nickel, chromium and titanium. The low-E coating is exposed to laser pulses having a duration of no more than 10-12 seconds, a wavelength of 355-500 nm, and a power density of more than 30 kW/cm2. The exposing is performed so as to avoid increasing temperature of the low-E coating to more than 300 degrees C while also reducing (a) grain boundaries with respect to, and vacancies in, each said silver-based layer, (b) each said silver-based layer's refractive index, and (c) emissivity of the low-E coating compared to its as-deposited form.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DEVICES USING STIMULATED EMISSION DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same |
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