Fremgangsmate for fremstilling av triklorsilan og silisium for bruk i fremstillingen av triklorsilan
The present invention relates to a method for the production of trichlorosilane by reaction of silicon with HCl gas at a temperature between 250 and 1100° C., and an absolute pressure of 0.5-30 atm in a fluidized bed reactor, in a stirred bed reactor or a solid bed reactor, where the silicon supplie...
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