EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
An extreme ultraviolet light generation apparatus may include a chamber; a droplet generator configured to sequentially supply a first droplet of target substance to a plasma generation region in the chamber; and a gas flow generation device having a gas outlet for causing gas to flow along a travel...
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| creator | FUMIO IWAMOTO |
| description | An extreme ultraviolet light generation apparatus may include a chamber; a droplet generator configured to sequentially supply a first droplet of target substance to a plasma generation region in the chamber; and a gas flow generation device having a gas outlet for causing gas to flow along a travel direction of the first droplet around at least a part of a trajectory of the first droplet. Here, the droplet generator includes a vibrating element configured to generate, by applying vibration to a nozzle through Which the target substance is output, a plurality of second droplets each having smaller volume than the first droplet and to cause the second droplets to be combined to generate the first droplet, and the gas outlet is located downstream, on a trajectory direction of the first droplet, of a position Where the second droplets are combined and the first droplet is generated. |
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Here, the droplet generator includes a vibrating element configured to generate, by applying vibration to a nozzle through Which the target substance is output, a plurality of second droplets each having smaller volume than the first droplet and to cause the second droplets to be combined to generate the first droplet, and the gas outlet is located downstream, on a trajectory direction of the first droplet, of a position Where the second droplets are combined and the first droplet is generated.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; X-RAY TECHNIQUE</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220601&DB=EPODOC&CC=NL&NR=2029105A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220601&DB=EPODOC&CC=NL&NR=2029105A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FUMIO IWAMOTO</creatorcontrib><title>EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD</title><description>An extreme ultraviolet light generation apparatus may include a chamber; a droplet generator configured to sequentially supply a first droplet of target substance to a plasma generation region in the chamber; and a gas flow generation device having a gas outlet for causing gas to flow along a travel direction of the first droplet around at least a part of a trajectory of the first droplet. 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE |
| title | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD |
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