RETICLE SUB-FIELD THERMAL CONTROL

An apparatus for reticle sub-field thermal control in a lithography system is disclosed. The apparatus includes a clamp configured to fix an object. The clamp includes a plurality of gas distribution features that are spatially arranged in a pattern. The apparatus further includes a gas 5 pressure c...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ERIC JUSTIN MONKMAN, MICHAEL ANDREW CHIEDA, VICTOR ANTONIO PEREZ-FALCON, STEPHEN ROUX
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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