Lithographic system and method

A system for securing a particle to a pellicle membrane for subsequent use in a lithographic apparatus, the system comprising a particle securement device conﬁgured to secure the particle to the pellicle 5 membrane. The particle securement device is configured to direct the electron beam or the radi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	MARCUS ADRIANUS VAN DE KERKHOF, ERIC WILLEM FELIX CASIMIRI, ANDREY NIKIPELOV, STEFANO SALVATORE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A system for securing a particle to a pellicle membrane for subsequent use in a lithographic apparatus, the system comprising a particle securement device conﬁgured to secure the particle to the pellicle 5 membrane. The particle securement device is configured to direct the electron beam or the radiation beam such that the electron beam or the radiation beam passes through the pellicle membrane before being incident on the particle.