Optical measurement method and sensor apparatus

An optical measurement method using an optical sensor apparatus, the optical sensor apparatus comprising an optical element comprising a mark configured to selectively transmit incident radiation, a photodetector configured to receive radiation transmitted by the mark and provide an output signal th...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: WOUTER JOEP ENGELEN, THEODORUS FRANCISCUS EMILIUS MARIA OVERES, JORIS MARIA GERARDUS LOOMAN
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator WOUTER JOEP ENGELEN
THEODORUS FRANCISCUS EMILIUS MARIA OVERES
JORIS MARIA GERARDUS LOOMAN
description An optical measurement method using an optical sensor apparatus, the optical sensor apparatus comprising an optical element comprising a mark configured to selectively transmit incident radiation, a photodetector configured to receive radiation transmitted by the mark and provide an output signal that is indicative of the received radiation, and a support Which supports the optical element and is in thermal contact With the optical element. A thermal conductivity of the support is greater than a thermal conductivity of the optical element and a coefficient of thermal expansion of the support is greater than a coefficient of thermal expansion of the optical element. The method comprises performing a first measurement using the optical sensor apparatus, the first measurement including illuminating the mark With radiation. The temperature of the optical element changes during the first measurement. The temperature of the support is substantially constant throughout the first measurement.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_NL2022157A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>NL2022157A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_NL2022157A3</originalsourceid><addsrcrecordid>eNrjZND3LyjJTE7MUchNTSwuLUrNTc0rAbJLMvJTFBLzUhSKU_OK84sUEgsKEosSS0qLeRhY0xJzilN5oTQ3g7yba4izh25qQX58anFBYnJqXmpJvJ-PkYGRkaGpuaMxYRUArmgqew</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Optical measurement method and sensor apparatus</title><source>esp@cenet</source><creator>WOUTER JOEP ENGELEN ; THEODORUS FRANCISCUS EMILIUS MARIA OVERES ; JORIS MARIA GERARDUS LOOMAN</creator><creatorcontrib>WOUTER JOEP ENGELEN ; THEODORUS FRANCISCUS EMILIUS MARIA OVERES ; JORIS MARIA GERARDUS LOOMAN</creatorcontrib><description>An optical measurement method using an optical sensor apparatus, the optical sensor apparatus comprising an optical element comprising a mark configured to selectively transmit incident radiation, a photodetector configured to receive radiation transmitted by the mark and provide an output signal that is indicative of the received radiation, and a support Which supports the optical element and is in thermal contact With the optical element. A thermal conductivity of the support is greater than a thermal conductivity of the optical element and a coefficient of thermal expansion of the support is greater than a coefficient of thermal expansion of the optical element. The method comprises performing a first measurement using the optical sensor apparatus, the first measurement including illuminating the mark With radiation. The temperature of the optical element changes during the first measurement. The temperature of the support is substantially constant throughout the first measurement.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20190710&amp;DB=EPODOC&amp;CC=NL&amp;NR=2022157A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20190710&amp;DB=EPODOC&amp;CC=NL&amp;NR=2022157A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WOUTER JOEP ENGELEN</creatorcontrib><creatorcontrib>THEODORUS FRANCISCUS EMILIUS MARIA OVERES</creatorcontrib><creatorcontrib>JORIS MARIA GERARDUS LOOMAN</creatorcontrib><title>Optical measurement method and sensor apparatus</title><description>An optical measurement method using an optical sensor apparatus, the optical sensor apparatus comprising an optical element comprising a mark configured to selectively transmit incident radiation, a photodetector configured to receive radiation transmitted by the mark and provide an output signal that is indicative of the received radiation, and a support Which supports the optical element and is in thermal contact With the optical element. A thermal conductivity of the support is greater than a thermal conductivity of the optical element and a coefficient of thermal expansion of the support is greater than a coefficient of thermal expansion of the optical element. The method comprises performing a first measurement using the optical sensor apparatus, the first measurement including illuminating the mark With radiation. The temperature of the optical element changes during the first measurement. The temperature of the support is substantially constant throughout the first measurement.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND3LyjJTE7MUchNTSwuLUrNTc0rAbJLMvJTFBLzUhSKU_OK84sUEgsKEosSS0qLeRhY0xJzilN5oTQ3g7yba4izh25qQX58anFBYnJqXmpJvJ-PkYGRkaGpuaMxYRUArmgqew</recordid><startdate>20190710</startdate><enddate>20190710</enddate><creator>WOUTER JOEP ENGELEN</creator><creator>THEODORUS FRANCISCUS EMILIUS MARIA OVERES</creator><creator>JORIS MARIA GERARDUS LOOMAN</creator><scope>EVB</scope></search><sort><creationdate>20190710</creationdate><title>Optical measurement method and sensor apparatus</title><author>WOUTER JOEP ENGELEN ; THEODORUS FRANCISCUS EMILIUS MARIA OVERES ; JORIS MARIA GERARDUS LOOMAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_NL2022157A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2019</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>WOUTER JOEP ENGELEN</creatorcontrib><creatorcontrib>THEODORUS FRANCISCUS EMILIUS MARIA OVERES</creatorcontrib><creatorcontrib>JORIS MARIA GERARDUS LOOMAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WOUTER JOEP ENGELEN</au><au>THEODORUS FRANCISCUS EMILIUS MARIA OVERES</au><au>JORIS MARIA GERARDUS LOOMAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Optical measurement method and sensor apparatus</title><date>2019-07-10</date><risdate>2019</risdate><abstract>An optical measurement method using an optical sensor apparatus, the optical sensor apparatus comprising an optical element comprising a mark configured to selectively transmit incident radiation, a photodetector configured to receive radiation transmitted by the mark and provide an output signal that is indicative of the received radiation, and a support Which supports the optical element and is in thermal contact With the optical element. A thermal conductivity of the support is greater than a thermal conductivity of the optical element and a coefficient of thermal expansion of the support is greater than a coefficient of thermal expansion of the optical element. The method comprises performing a first measurement using the optical sensor apparatus, the first measurement including illuminating the mark With radiation. The temperature of the optical element changes during the first measurement. The temperature of the support is substantially constant throughout the first measurement.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_NL2022157A
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Optical measurement method and sensor apparatus
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T13%3A26%3A11IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WOUTER%20JOEP%20ENGELEN&rft.date=2019-07-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ENL2022157A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true