A Lithographic Apparatus and a Device Manufacturing Method

A lithographic apparatus comprising: a substrate holder configured to hold a substrate; a projection system arranged to project an image onto a substrate held by the substrate holder; a liquid confinement system configured to confine an immersion liquid to a space between the projection system and t...

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Bibliographische Detailangaben
Hauptverfasser:	WILHELMUS JACOBUS JOHANNES WELTERS, THOMAS POIESZ, LAURA MARIA FERNANDEZ DIAZ, JIMMY MATHEUS WILHELMUS VAN DE WINKEL, DIRK WILLEM HARBERTS, JOHANNES ADRIANUS CORNELIS MARIA PIJNENBURG, BERT DIRK SCHOLTEN, LUCAS HENRICUS JOHANNES STEVENS, ABRAHAM ALEXANDER SOETHOUDT
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus comprising: a substrate holder configured to hold a substrate; a projection system arranged to project an image onto a substrate held by the substrate holder; a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder whilst the immersion liquid is confined to the space.