METHOD FOR REMOVING PHOTOSENSITIVE MATERIAL ON A SUBSTRATE
The present invention provides a method of processing a substrate comprising: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing photosensitive material from around an outer edge of the layer of photosensitive material, and controlling the remov...
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| creator | GIJSBERT RISPENS CHRISTIANUS WILHELMUS JOHANNES BERENDSEN JOHAN FRANCISCUS MARIA BECKERS DAAN DANIEL JOHANNES ANTONIUS VAN SOMMEREN THEODORUS JOHANNES ANTONIUS RENCKENS GÜNES NAKIBOGLU |
| description | The present invention provides a method of processing a substrate comprising: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing photosensitive material from around an outer edge of the layer of photosensitive material, and controlling the removing so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate. |
| format | Patent |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | METHOD FOR REMOVING PHOTOSENSITIVE MATERIAL ON A SUBSTRATE |
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