Electron Source
An electron source configured to provide a beam of electrons which propagate substantially along an axis. The electron source comprising a photocathode including a target region configured to emit electrons when illuminated with radiation, wherein the target region is separated from the axis and an...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | WOUTER JOEP ENGELEN GERRIT JACOBUS HENDRIK BRUSSAARD |
| description | An electron source configured to provide a beam of electrons which propagate substantially along an axis. The electron source comprising a photocathode including a target region configured to emit electrons when illuminated with radiation, wherein the target region is separated from the axis and an anode, wherein the photocathode and the anode are configured to generate an electric field which causes electrons emitted from the target region of the photocathode to be accelerated away from the photocathode and wherein the photocathode and the anode are configured such that the electric field direction is substantially the same throughout the target region, and is inclined toward |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_NL2017475A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>NL2017475A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_NL2017475A3</originalsourceid><addsrcrecordid>eNrjZOB3zUlNLinKz1MIzi8tSk7lYWBNS8wpTuWF0twM8m6uIc4euqkF-fGpxQWJyal5qSXxfj5GBobmJuamjsaEVQAAB40eBQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Electron Source</title><source>esp@cenet</source><creator>WOUTER JOEP ENGELEN ; GERRIT JACOBUS HENDRIK BRUSSAARD</creator><creatorcontrib>WOUTER JOEP ENGELEN ; GERRIT JACOBUS HENDRIK BRUSSAARD</creatorcontrib><description>An electron source configured to provide a beam of electrons which propagate substantially along an axis. The electron source comprising a photocathode including a target region configured to emit electrons when illuminated with radiation, wherein the target region is separated from the axis and an anode, wherein the photocathode and the anode are configured to generate an electric field which causes electrons emitted from the target region of the photocathode to be accelerated away from the photocathode and wherein the photocathode and the anode are configured such that the electric field direction is substantially the same throughout the target region, and is inclined toward</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; DEVICES USING STIMULATED EMISSION ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2017</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170519&DB=EPODOC&CC=NL&NR=2017475A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20170519&DB=EPODOC&CC=NL&NR=2017475A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WOUTER JOEP ENGELEN</creatorcontrib><creatorcontrib>GERRIT JACOBUS HENDRIK BRUSSAARD</creatorcontrib><title>Electron Source</title><description>An electron source configured to provide a beam of electrons which propagate substantially along an axis. The electron source comprising a photocathode including a target region configured to emit electrons when illuminated with radiation, wherein the target region is separated from the axis and an anode, wherein the photocathode and the anode are configured to generate an electric field which causes electrons emitted from the target region of the photocathode to be accelerated away from the photocathode and wherein the photocathode and the anode are configured such that the electric field direction is substantially the same throughout the target region, and is inclined toward</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2017</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOB3zUlNLinKz1MIzi8tSk7lYWBNS8wpTuWF0twM8m6uIc4euqkF-fGpxQWJyal5qSXxfj5GBobmJuamjsaEVQAAB40eBQ</recordid><startdate>20170519</startdate><enddate>20170519</enddate><creator>WOUTER JOEP ENGELEN</creator><creator>GERRIT JACOBUS HENDRIK BRUSSAARD</creator><scope>EVB</scope></search><sort><creationdate>20170519</creationdate><title>Electron Source</title><author>WOUTER JOEP ENGELEN ; GERRIT JACOBUS HENDRIK BRUSSAARD</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_NL2017475A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2017</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>WOUTER JOEP ENGELEN</creatorcontrib><creatorcontrib>GERRIT JACOBUS HENDRIK BRUSSAARD</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WOUTER JOEP ENGELEN</au><au>GERRIT JACOBUS HENDRIK BRUSSAARD</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Electron Source</title><date>2017-05-19</date><risdate>2017</risdate><abstract>An electron source configured to provide a beam of electrons which propagate substantially along an axis. The electron source comprising a photocathode including a target region configured to emit electrons when illuminated with radiation, wherein the target region is separated from the axis and an anode, wherein the photocathode and the anode are configured to generate an electric field which causes electrons emitted from the target region of the photocathode to be accelerated away from the photocathode and wherein the photocathode and the anode are configured such that the electric field direction is substantially the same throughout the target region, and is inclined toward</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_NL2017475A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | Electron Source |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T12%3A36%3A44IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WOUTER%20JOEP%20ENGELEN&rft.date=2017-05-19&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ENL2017475A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |