A Support Apparatus, a Lithographic Apparatus and a Device Manufacturing Method
A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support a...
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| creator | SIMON KAREL RAVENSBERGEN NIEK JACOBUS JOHANNES ROSET GIJS KRAMER PIETER RENAAT MARIA HENNUS |
| description | A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid 11 is retained on the projection and in contact with an object supported on the object holder. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_NL2016469A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>NL2016469A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_NL2016469A3</originalsourceid><addsrcrecordid>eNrjZPB3VAguLSjILypRcCwoSCxKLCkt1lFIVPDJLMnITy9KLMjITEbIKCTmpQAlXVLLMpNTFXwT80rTEpNLSosy89IVfFOBOlJ4GFjTEnOKU3mhNDeDvJtriLOHbmpBfnxqcUFicmpeakm8n4-RgaGZiZmlozFhFQATMDVg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A Support Apparatus, a Lithographic Apparatus and a Device Manufacturing Method</title><source>esp@cenet</source><creator>SIMON KAREL RAVENSBERGEN ; NIEK JACOBUS JOHANNES ROSET ; GIJS KRAMER ; PIETER RENAAT MARIA HENNUS</creator><creatorcontrib>SIMON KAREL RAVENSBERGEN ; NIEK JACOBUS JOHANNES ROSET ; GIJS KRAMER ; PIETER RENAAT MARIA HENNUS</creatorcontrib><description>A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid 11 is retained on the projection and in contact with an object supported on the object holder.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2016</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161107&DB=EPODOC&CC=NL&NR=2016469A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20161107&DB=EPODOC&CC=NL&NR=2016469A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SIMON KAREL RAVENSBERGEN</creatorcontrib><creatorcontrib>NIEK JACOBUS JOHANNES ROSET</creatorcontrib><creatorcontrib>GIJS KRAMER</creatorcontrib><creatorcontrib>PIETER RENAAT MARIA HENNUS</creatorcontrib><title>A Support Apparatus, a Lithographic Apparatus and a Device Manufacturing Method</title><description>A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid 11 is retained on the projection and in contact with an object supported on the object holder.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2016</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPB3VAguLSjILypRcCwoSCxKLCkt1lFIVPDJLMnITy9KLMjITEbIKCTmpQAlXVLLMpNTFXwT80rTEpNLSosy89IVfFOBOlJ4GFjTEnOKU3mhNDeDvJtriLOHbmpBfnxqcUFicmpeakm8n4-RgaGZiZmlozFhFQATMDVg</recordid><startdate>20161107</startdate><enddate>20161107</enddate><creator>SIMON KAREL RAVENSBERGEN</creator><creator>NIEK JACOBUS JOHANNES ROSET</creator><creator>GIJS KRAMER</creator><creator>PIETER RENAAT MARIA HENNUS</creator><scope>EVB</scope></search><sort><creationdate>20161107</creationdate><title>A Support Apparatus, a Lithographic Apparatus and a Device Manufacturing Method</title><author>SIMON KAREL RAVENSBERGEN ; NIEK JACOBUS JOHANNES ROSET ; GIJS KRAMER ; PIETER RENAAT MARIA HENNUS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_NL2016469A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2016</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SIMON KAREL RAVENSBERGEN</creatorcontrib><creatorcontrib>NIEK JACOBUS JOHANNES ROSET</creatorcontrib><creatorcontrib>GIJS KRAMER</creatorcontrib><creatorcontrib>PIETER RENAAT MARIA HENNUS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SIMON KAREL RAVENSBERGEN</au><au>NIEK JACOBUS JOHANNES ROSET</au><au>GIJS KRAMER</au><au>PIETER RENAAT MARIA HENNUS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A Support Apparatus, a Lithographic Apparatus and a Device Manufacturing Method</title><date>2016-11-07</date><risdate>2016</risdate><abstract>A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid 11 is retained on the projection and in contact with an object supported on the object holder.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | A Support Apparatus, a Lithographic Apparatus and a Device Manufacturing Method |
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