ELECTRON INJECTOR AND FREE ELECTRON LASER
An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunche...
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| creator | KATALENIC ANDELKO ROOT WILHELMUS PATRICK ELISABETH MARIA JAGER PIETER WILLEM HERMAN BARTRAIJ PETRUS RUTGERUS ENGELEN WOUTER JOEP GRIMMINCK LEONARDUS ADRIANUS GERARDUS AKKERMANS JOHANNES ANTONIUS GERARDUS VRIES GOSSE CHARLES LOOPSTRA ERIK ROELOF BANINE VADIM YEVGENYEVICH NIKIPELOV ANDREY ALEXANDROVICH COENEN TEIS JOHAN FRIJNS OLAV WALDEMAR VLADIMIR |
| description | An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only. |
| format | Patent |
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The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; DEVICES USING STIMULATED EMISSION ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150608&DB=EPODOC&CC=NL&NR=2013885A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150608&DB=EPODOC&CC=NL&NR=2013885A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KATALENIC ANDELKO</creatorcontrib><creatorcontrib>ROOT WILHELMUS PATRICK ELISABETH MARIA</creatorcontrib><creatorcontrib>JAGER PIETER WILLEM HERMAN</creatorcontrib><creatorcontrib>BARTRAIJ PETRUS RUTGERUS</creatorcontrib><creatorcontrib>ENGELEN WOUTER JOEP</creatorcontrib><creatorcontrib>GRIMMINCK LEONARDUS ADRIANUS GERARDUS</creatorcontrib><creatorcontrib>AKKERMANS JOHANNES ANTONIUS GERARDUS</creatorcontrib><creatorcontrib>VRIES GOSSE CHARLES</creatorcontrib><creatorcontrib>LOOPSTRA ERIK ROELOF</creatorcontrib><creatorcontrib>BANINE VADIM YEVGENYEVICH</creatorcontrib><creatorcontrib>NIKIPELOV ANDREY ALEXANDROVICH</creatorcontrib><creatorcontrib>COENEN TEIS JOHAN</creatorcontrib><creatorcontrib>FRIJNS OLAV WALDEMAR VLADIMIR</creatorcontrib><title>ELECTRON INJECTOR AND FREE ELECTRON LASER</title><description>An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB09XF1Dgny91Pw9PMCsvyDFBz9XBTcglxdFeBSPo7BrkE8DKxpiTnFqbxQmptB3s01xNlDN7UgPz61uCAxOTUvtSTez8fIwNDYwsLU0ZiwCgCTxiN2</recordid><startdate>20150608</startdate><enddate>20150608</enddate><creator>KATALENIC ANDELKO</creator><creator>ROOT WILHELMUS PATRICK ELISABETH MARIA</creator><creator>JAGER PIETER WILLEM HERMAN</creator><creator>BARTRAIJ PETRUS RUTGERUS</creator><creator>ENGELEN WOUTER JOEP</creator><creator>GRIMMINCK LEONARDUS ADRIANUS GERARDUS</creator><creator>AKKERMANS JOHANNES ANTONIUS GERARDUS</creator><creator>VRIES GOSSE CHARLES</creator><creator>LOOPSTRA ERIK ROELOF</creator><creator>BANINE VADIM YEVGENYEVICH</creator><creator>NIKIPELOV ANDREY ALEXANDROVICH</creator><creator>COENEN TEIS JOHAN</creator><creator>FRIJNS OLAV WALDEMAR VLADIMIR</creator><scope>EVB</scope></search><sort><creationdate>20150608</creationdate><title>ELECTRON INJECTOR AND FREE ELECTRON LASER</title><author>KATALENIC ANDELKO ; ROOT WILHELMUS PATRICK ELISABETH MARIA ; JAGER PIETER WILLEM HERMAN ; BARTRAIJ PETRUS RUTGERUS ; ENGELEN WOUTER JOEP ; GRIMMINCK LEONARDUS ADRIANUS GERARDUS ; AKKERMANS JOHANNES ANTONIUS GERARDUS ; VRIES GOSSE CHARLES ; LOOPSTRA ERIK ROELOF ; BANINE VADIM YEVGENYEVICH ; NIKIPELOV ANDREY ALEXANDROVICH ; COENEN TEIS JOHAN ; FRIJNS OLAV WALDEMAR VLADIMIR</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_NL2013885A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><toplevel>online_resources</toplevel><creatorcontrib>KATALENIC ANDELKO</creatorcontrib><creatorcontrib>ROOT WILHELMUS PATRICK ELISABETH MARIA</creatorcontrib><creatorcontrib>JAGER PIETER WILLEM HERMAN</creatorcontrib><creatorcontrib>BARTRAIJ PETRUS RUTGERUS</creatorcontrib><creatorcontrib>ENGELEN WOUTER JOEP</creatorcontrib><creatorcontrib>GRIMMINCK LEONARDUS ADRIANUS GERARDUS</creatorcontrib><creatorcontrib>AKKERMANS JOHANNES ANTONIUS GERARDUS</creatorcontrib><creatorcontrib>VRIES GOSSE CHARLES</creatorcontrib><creatorcontrib>LOOPSTRA ERIK ROELOF</creatorcontrib><creatorcontrib>BANINE VADIM YEVGENYEVICH</creatorcontrib><creatorcontrib>NIKIPELOV ANDREY ALEXANDROVICH</creatorcontrib><creatorcontrib>COENEN TEIS JOHAN</creatorcontrib><creatorcontrib>FRIJNS OLAV WALDEMAR VLADIMIR</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KATALENIC ANDELKO</au><au>ROOT WILHELMUS PATRICK ELISABETH MARIA</au><au>JAGER PIETER WILLEM HERMAN</au><au>BARTRAIJ PETRUS RUTGERUS</au><au>ENGELEN WOUTER JOEP</au><au>GRIMMINCK LEONARDUS ADRIANUS GERARDUS</au><au>AKKERMANS JOHANNES ANTONIUS GERARDUS</au><au>VRIES GOSSE CHARLES</au><au>LOOPSTRA ERIK ROELOF</au><au>BANINE VADIM YEVGENYEVICH</au><au>NIKIPELOV ANDREY ALEXANDROVICH</au><au>COENEN TEIS JOHAN</au><au>FRIJNS OLAV WALDEMAR VLADIMIR</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ELECTRON INJECTOR AND FREE ELECTRON LASER</title><date>2015-06-08</date><risdate>2015</risdate><abstract>An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS |
| title | ELECTRON INJECTOR AND FREE ELECTRON LASER |
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