POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE, METHOD FOR PRODUCING MAGNETIC DISK SUBSTRATE, AND METHOD FOR POLISHING SAME
Provided is a magnetic disk substrate polishing composition capable of combining a high polishing rate and reduction of waviness with the use of a silica abrasive. This application provides a magnetic disk substrate polishing composition comprising an abrasive that comprises silica particles, and wa...
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| creator | Taira OTSU Noritaka YOKOMICHI Yasushi MATSUNAMI |
| description | Provided is a magnetic disk substrate polishing composition capable of combining a high polishing rate and reduction of waviness with the use of a silica abrasive. This application provides a magnetic disk substrate polishing composition comprising an abrasive that comprises silica particles, and water. The abrasive has a cumulative 90th percentile aspect ratio (A90) of 1.25 or higher in the abrasive?s aspect ratio distribution by volume, and has a cumulative 50th percentile aspect ratio (A50) of 1.25 or lower in the same aspect ratio distribution. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_MY193182A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>MY193182A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_MY193182A3</originalsourceid><addsrcrecordid>eNrjZKgL8PfxDPbw9HNXcPb3DfAP9gzx9PdTcPMPUvB1dPdzDfF0VnDxDPZWCA51Cg4Jcgxx1VHwdQ3x8HcBqwkI8ncJdQbpxqna0c8FRQfcvmBHX1ceBta0xJziVF4ozc0g5-Ya4uyhm1qQH59aXJCYnJqXWhLvG2loaWxoYeRoTFABALr_Opo</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE, METHOD FOR PRODUCING MAGNETIC DISK SUBSTRATE, AND METHOD FOR POLISHING SAME</title><source>esp@cenet</source><creator>Taira OTSU ; Noritaka YOKOMICHI ; Yasushi MATSUNAMI</creator><creatorcontrib>Taira OTSU ; Noritaka YOKOMICHI ; Yasushi MATSUNAMI</creatorcontrib><description>Provided is a magnetic disk substrate polishing composition capable of combining a high polishing rate and reduction of waviness with the use of a silica abrasive. This application provides a magnetic disk substrate polishing composition comprising an abrasive that comprises silica particles, and water. The abrasive has a cumulative 90th percentile aspect ratio (A90) of 1.25 or higher in the abrasive?s aspect ratio distribution by volume, and has a cumulative 50th percentile aspect ratio (A50) of 1.25 or lower in the same aspect ratio distribution.</description><language>eng</language><subject>ADHESIVES ; CHEMISTRY ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; DYES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; INFORMATION STORAGE ; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; PERFORMING OPERATIONS ; PHYSICS ; POLISHES ; POLISHING ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220926&DB=EPODOC&CC=MY&NR=193182A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220926&DB=EPODOC&CC=MY&NR=193182A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Taira OTSU</creatorcontrib><creatorcontrib>Noritaka YOKOMICHI</creatorcontrib><creatorcontrib>Yasushi MATSUNAMI</creatorcontrib><title>POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE, METHOD FOR PRODUCING MAGNETIC DISK SUBSTRATE, AND METHOD FOR POLISHING SAME</title><description>Provided is a magnetic disk substrate polishing composition capable of combining a high polishing rate and reduction of waviness with the use of a silica abrasive. This application provides a magnetic disk substrate polishing composition comprising an abrasive that comprises silica particles, and water. The abrasive has a cumulative 90th percentile aspect ratio (A90) of 1.25 or higher in the abrasive?s aspect ratio distribution by volume, and has a cumulative 50th percentile aspect ratio (A50) of 1.25 or lower in the same aspect ratio distribution.</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>DYES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>INFORMATION STORAGE</subject><subject>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>POLISHES</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZKgL8PfxDPbw9HNXcPb3DfAP9gzx9PdTcPMPUvB1dPdzDfF0VnDxDPZWCA51Cg4Jcgxx1VHwdQ3x8HcBqwkI8ncJdQbpxqna0c8FRQfcvmBHX1ceBta0xJziVF4ozc0g5-Ya4uyhm1qQH59aXJCYnJqXWhLvG2loaWxoYeRoTFABALr_Opo</recordid><startdate>20220926</startdate><enddate>20220926</enddate><creator>Taira OTSU</creator><creator>Noritaka YOKOMICHI</creator><creator>Yasushi MATSUNAMI</creator><scope>EVB</scope></search><sort><creationdate>20220926</creationdate><title>POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE, METHOD FOR PRODUCING MAGNETIC DISK SUBSTRATE, AND METHOD FOR POLISHING SAME</title><author>Taira OTSU ; Noritaka YOKOMICHI ; Yasushi MATSUNAMI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_MY193182A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>DYES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>INFORMATION STORAGE</topic><topic>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>POLISHES</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>Taira OTSU</creatorcontrib><creatorcontrib>Noritaka YOKOMICHI</creatorcontrib><creatorcontrib>Yasushi MATSUNAMI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Taira OTSU</au><au>Noritaka YOKOMICHI</au><au>Yasushi MATSUNAMI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE, METHOD FOR PRODUCING MAGNETIC DISK SUBSTRATE, AND METHOD FOR POLISHING SAME</title><date>2022-09-26</date><risdate>2022</risdate><abstract>Provided is a magnetic disk substrate polishing composition capable of combining a high polishing rate and reduction of waviness with the use of a silica abrasive. This application provides a magnetic disk substrate polishing composition comprising an abrasive that comprises silica particles, and water. The abrasive has a cumulative 90th percentile aspect ratio (A90) of 1.25 or higher in the abrasive?s aspect ratio distribution by volume, and has a cumulative 50th percentile aspect ratio (A50) of 1.25 or lower in the same aspect ratio distribution.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES CHEMISTRY DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS PHYSICS POLISHES POLISHING TRANSPORTING |
| title | POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE, METHOD FOR PRODUCING MAGNETIC DISK SUBSTRATE, AND METHOD FOR POLISHING SAME |
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