POLISHING COMPOSITION

Proposed is a polishing composition including hydroxyethyl cellulose, water and abrasive grains, wherein the hydroxyethyl cellulose has a molecular weight of 500,000 or more and 1,500,000 or less, and the mass ratio of the hydroxyethyl cellulose to the abrasive grains is 0.0075 or more and 0.025 or...

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Hauptverfasser:	SUGITA, NORIAKI, NAKAUCHI, TATSUYA, HABA, SHINICHI, MIYAMOTO, AKIKO, TERAMOTO, MASASHI
Format:	Patent
Sprache:	eng
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creator	SUGITA, NORIAKI NAKAUCHI, TATSUYA HABA, SHINICHI MIYAMOTO, AKIKO TERAMOTO, MASASHI
description	Proposed is a polishing composition including hydroxyethyl cellulose, water and abrasive grains, wherein the hydroxyethyl cellulose has a molecular weight of 500,000 or more and 1,500,000 or less, and the mass ratio of the hydroxyethyl cellulose to the abrasive grains is 0.0075 or more and 0.025 or less.
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title	POLISHING COMPOSITION
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