REGION BASED SHUTTER ADAPTATION METHOD FOR IMAGE EXPOSURE

The present invention discloses a region based shutter adaptation method for image exposure. The method includes the steps of: (a) providing an image which is non-uniformly illuminated; (b) segmenting the image into two or more non-overlapping regions; (c) identifying brightness values for each of t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WILLIE SONG, WUI-PIN LEE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention discloses a region based shutter adaptation method for image exposure. The method includes the steps of: (a) providing an image which is non-uniformly illuminated; (b) segmenting the image into two or more non-overlapping regions; (c) identifying brightness values for each of the regions when more than one brightness value has been produced for each of the regions; (d) applying the whole image with different shutters for different regions; and (e) exposing different regions for different exposure durations according to the brightness values respectively assigned to the regions, so that the present invention is capable of enabling different regions within the whole image which is non-uniformly illuminated to have different shutter adaptions. (Figure 5)