METHOD FOR THE MULTI-LAYER AND MULTI-COMPONENT COATING OF THIN FILMS ON SUBSTRATES OF DIFFERENT MATERIALS

The invention relates to a method for depositing thin films of multi-components and nanostructures. Various parameters are controlled during the method in order to produce the structure of the thin films: the residence time of the mixture of gases in the reactor is controlled by the pump velocity, a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JORGE ALVAREZ DIAZ, JOAQUIN OSEGUERA PEÑA, JORGE ALBERTO ACOSTA FLORES, DULCE VIRIDIANA MELO MAXIMO, OLIMPIA SALAS MARTINEZ, ALEJANDRO ROJO VALERIO
Format:	Patent
Sprache:	eng ; spa
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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