적층 조형물의 제조 방법, 감열 겔화제 및 적층 조형용 조성물
수경화성 무기 조성물과 감열 겔화제를 함유하는 적층 조형용 조성물을 적층하고, 적층시 및/또는 적층 후의 가열에 의해, 적층 조형용 조성물을 비유동화시키는, 적층 조형물의 제조 방법으로서, 감열 겔화제는, 수성 매체와, 이 수성 매체 중에 분산된 폴리머와, 담점이 30 ℃ 이상 또한 HLB 값이 10 ∼ 18 인 논이온 계면 활성제를 함유하고, 감열 겔화제는, 탈포 직후의 17±3 ℃ 에서의 관입 저항값을 a0, 탈포 후 600 W 30 초의 마이크로 웨이브 가열 후의 17±3 ℃ 에서의 관입 저항값 a1 로 했을 때에, a1/a0...
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| creator | TANEMURA ATSUMI |
| description | 수경화성 무기 조성물과 감열 겔화제를 함유하는 적층 조형용 조성물을 적층하고, 적층시 및/또는 적층 후의 가열에 의해, 적층 조형용 조성물을 비유동화시키는, 적층 조형물의 제조 방법으로서, 감열 겔화제는, 수성 매체와, 이 수성 매체 중에 분산된 폴리머와, 담점이 30 ℃ 이상 또한 HLB 값이 10 ∼ 18 인 논이온 계면 활성제를 함유하고, 감열 겔화제는, 탈포 직후의 17±3 ℃ 에서의 관입 저항값을 a0, 탈포 후 600 W 30 초의 마이크로 웨이브 가열 후의 17±3 ℃ 에서의 관입 저항값 a1 로 했을 때에, a1/a0 의 값이 15 이상이 되는 감열 겔화제인, 제조 방법.
A method for producing an additive manufactured object, the method comprising layering a composition for additive manufacturing comprising a water-curable inorganic composition and a heat-sensitive gelling agent, and non-fluidizing the composition for additive manufacturing by heating at the time of layering and/or after layering, wherein the heat-sensitive gelling agent contains an aqueous medium, a polymer dispersed in the aqueous medium, and a nonionic surfactant having a cloud point of 30°C or higher and an HLB value of 10 to 18, and the heat-sensitive gelling agent is a heat-sensitive gelling agent having a value of a1/a0 of 15 or more when a penetration resistance value at 17 ± 3°C immediately after defoaming is defined as a0 and a penetration resistance value at 17 ± 3°C after microwave heating at 600 W for 30 seconds after defoaming is defined as a1. |
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A method for producing an additive manufactured object, the method comprising layering a composition for additive manufacturing comprising a water-curable inorganic composition and a heat-sensitive gelling agent, and non-fluidizing the composition for additive manufacturing by heating at the time of layering and/or after layering, wherein the heat-sensitive gelling agent contains an aqueous medium, a polymer dispersed in the aqueous medium, and a nonionic surfactant having a cloud point of 30°C or higher and an HLB value of 10 to 18, and the heat-sensitive gelling agent is a heat-sensitive gelling agent having a value of a1/a0 of 15 or more when a penetration resistance value at 17 ± 3°C immediately after defoaming is defined as a0 and a penetration resistance value at 17 ± 3°C after microwave heating at 600 W for 30 seconds after defoaming is defined as a1.</description><language>kor</language><subject>ADDITIVE MANUFACTURING TECHNOLOGY ; ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING ; ARTIFICIAL STONE ; CEMENTS ; CERAMICS ; CHEMISTRY ; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS ; CONCRETE ; LIME, MAGNESIA ; METALLURGY ; PERFORMING OPERATIONS ; REFRACTORIES ; SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER ; SLAG ; TRANSPORTING ; TREATMENT OF NATURAL STONE ; WORKING CEMENT, CLAY, OR STONE</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241028&DB=EPODOC&CC=KR&NR=20240155277A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25555,76308</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241028&DB=EPODOC&CC=KR&NR=20240155277A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TANEMURA ATSUMI</creatorcontrib><title>적층 조형물의 제조 방법, 감열 겔화제 및 적층 조형용 조성물</title><description>수경화성 무기 조성물과 감열 겔화제를 함유하는 적층 조형용 조성물을 적층하고, 적층시 및/또는 적층 후의 가열에 의해, 적층 조형용 조성물을 비유동화시키는, 적층 조형물의 제조 방법으로서, 감열 겔화제는, 수성 매체와, 이 수성 매체 중에 분산된 폴리머와, 담점이 30 ℃ 이상 또한 HLB 값이 10 ∼ 18 인 논이온 계면 활성제를 함유하고, 감열 겔화제는, 탈포 직후의 17±3 ℃ 에서의 관입 저항값을 a0, 탈포 후 600 W 30 초의 마이크로 웨이브 가열 후의 17±3 ℃ 에서의 관입 저항값 a1 로 했을 때에, a1/a0 의 값이 15 이상이 되는 감열 겔화제인, 제조 방법.
A method for producing an additive manufactured object, the method comprising layering a composition for additive manufacturing comprising a water-curable inorganic composition and a heat-sensitive gelling agent, and non-fluidizing the composition for additive manufacturing by heating at the time of layering and/or after layering, wherein the heat-sensitive gelling agent contains an aqueous medium, a polymer dispersed in the aqueous medium, and a nonionic surfactant having a cloud point of 30°C or higher and an HLB value of 10 to 18, and the heat-sensitive gelling agent is a heat-sensitive gelling agent having a value of a1/a0 of 15 or more when a penetration resistance value at 17 ± 3°C immediately after defoaming is defined as a0 and a penetration resistance value at 17 ± 3°C after microwave heating at 600 W for 30 seconds after defoaming is defined as a1.</description><subject>ADDITIVE MANUFACTURING TECHNOLOGY</subject><subject>ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING</subject><subject>ARTIFICIAL STONE</subject><subject>CEMENTS</subject><subject>CERAMICS</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</subject><subject>CONCRETE</subject><subject>LIME, MAGNESIA</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>REFRACTORIES</subject><subject>SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER</subject><subject>SLAG</subject><subject>TRANSPORTING</subject><subject>TREATMENT OF NATURAL STONE</subject><subject>WORKING CEMENT, CLAY, OR STONE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAh6s6DxzY6tCm8Wbng7Y-rrNXvezJ2h8GbBHCBf4fWGla83TdVReLVhwpvpWxRebZryduYUoBxQol8BRd-bWStBrDctG4Em8DCwpiXmFKfyQmluBmU31xBnD93Ugvz41OKCxOTUvNSSeO8gIwMjEwNDU1Mjc3NHY-JUAQAKbVAN</recordid><startdate>20241028</startdate><enddate>20241028</enddate><creator>TANEMURA ATSUMI</creator><scope>EVB</scope></search><sort><creationdate>20241028</creationdate><title>적층 조형물의 제조 방법, 감열 겔화제 및 적층 조형용 조성물</title><author>TANEMURA ATSUMI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20240155277A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2024</creationdate><topic>ADDITIVE MANUFACTURING TECHNOLOGY</topic><topic>ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING</topic><topic>ARTIFICIAL STONE</topic><topic>CEMENTS</topic><topic>CERAMICS</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</topic><topic>CONCRETE</topic><topic>LIME, MAGNESIA</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>REFRACTORIES</topic><topic>SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER</topic><topic>SLAG</topic><topic>TRANSPORTING</topic><topic>TREATMENT OF NATURAL STONE</topic><topic>WORKING CEMENT, CLAY, OR STONE</topic><toplevel>online_resources</toplevel><creatorcontrib>TANEMURA ATSUMI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TANEMURA ATSUMI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>적층 조형물의 제조 방법, 감열 겔화제 및 적층 조형용 조성물</title><date>2024-10-28</date><risdate>2024</risdate><abstract>수경화성 무기 조성물과 감열 겔화제를 함유하는 적층 조형용 조성물을 적층하고, 적층시 및/또는 적층 후의 가열에 의해, 적층 조형용 조성물을 비유동화시키는, 적층 조형물의 제조 방법으로서, 감열 겔화제는, 수성 매체와, 이 수성 매체 중에 분산된 폴리머와, 담점이 30 ℃ 이상 또한 HLB 값이 10 ∼ 18 인 논이온 계면 활성제를 함유하고, 감열 겔화제는, 탈포 직후의 17±3 ℃ 에서의 관입 저항값을 a0, 탈포 후 600 W 30 초의 마이크로 웨이브 가열 후의 17±3 ℃ 에서의 관입 저항값 a1 로 했을 때에, a1/a0 의 값이 15 이상이 되는 감열 겔화제인, 제조 방법.
A method for producing an additive manufactured object, the method comprising layering a composition for additive manufacturing comprising a water-curable inorganic composition and a heat-sensitive gelling agent, and non-fluidizing the composition for additive manufacturing by heating at the time of layering and/or after layering, wherein the heat-sensitive gelling agent contains an aqueous medium, a polymer dispersed in the aqueous medium, and a nonionic surfactant having a cloud point of 30°C or higher and an HLB value of 10 to 18, and the heat-sensitive gelling agent is a heat-sensitive gelling agent having a value of a1/a0 of 15 or more when a penetration resistance value at 17 ± 3°C immediately after defoaming is defined as a0 and a penetration resistance value at 17 ± 3°C after microwave heating at 600 W for 30 seconds after defoaming is defined as a1.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADDITIVE MANUFACTURING TECHNOLOGY ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING ARTIFICIAL STONE CEMENTS CERAMICS CHEMISTRY COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE LIME, MAGNESIA METALLURGY PERFORMING OPERATIONS REFRACTORIES SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER SLAG TRANSPORTING TREATMENT OF NATURAL STONE WORKING CEMENT, CLAY, OR STONE |
| title | 적층 조형물의 제조 방법, 감열 겔화제 및 적층 조형용 조성물 |
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