PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER
본 기재는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러 필터에 관한 것이다. 일 구현예는 (A) 첨가제; (B) 바인더 수지; (C) 광중합성 화합물; (D) 광중합 개시제; (E) 착색제; 및 (F) 용매를 포함하는 감광성 수지 조성물이고, 상기 첨가제는 레벨링제를 포함하고, 상기 레벨링제는 상기 감광성 수지 조성물의 총량 중 50 ppm 내지 1,000 ppm 으로 포함되는, 감광성 수지 조성물을 제공한다....
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creator | KIM IEJU KIM KWANGSEOP KIM JIHONG KIM SABINA CHO MYUNGHO LEE SANGHO YOO JEONGHO KIM ICKJIN PARK BAEK SOUNG |
description | 본 기재는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러 필터에 관한 것이다. 일 구현예는 (A) 첨가제; (B) 바인더 수지; (C) 광중합성 화합물; (D) 광중합 개시제; (E) 착색제; 및 (F) 용매를 포함하는 감광성 수지 조성물이고, 상기 첨가제는 레벨링제를 포함하고, 상기 레벨링제는 상기 감광성 수지 조성물의 총량 중 50 ppm 내지 1,000 ppm 으로 포함되는, 감광성 수지 조성물을 제공한다. |
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KIM KWANGSEOP ; KIM JIHONG ; KIM SABINA ; CHO MYUNGHO ; LEE SANGHO ; YOO JEONGHO ; KIM ICKJIN ; PARK BAEK SOUNG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20240149708A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM IEJU</creatorcontrib><creatorcontrib>KIM KWANGSEOP</creatorcontrib><creatorcontrib>KIM JIHONG</creatorcontrib><creatorcontrib>KIM SABINA</creatorcontrib><creatorcontrib>CHO MYUNGHO</creatorcontrib><creatorcontrib>LEE SANGHO</creatorcontrib><creatorcontrib>YOO JEONGHO</creatorcontrib><creatorcontrib>KIM ICKJIN</creatorcontrib><creatorcontrib>PARK BAEK SOUNG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM IEJU</au><au>KIM KWANGSEOP</au><au>KIM JIHONG</au><au>KIM SABINA</au><au>CHO MYUNGHO</au><au>LEE SANGHO</au><au>YOO JEONGHO</au><au>KIM ICKJIN</au><au>PARK BAEK SOUNG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER</title><date>2024-10-15</date><risdate>2024</risdate><abstract>본 기재는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러 필터에 관한 것이다. 일 구현예는 (A) 첨가제; (B) 바인더 수지; (C) 광중합성 화합물; (D) 광중합 개시제; (E) 착색제; 및 (F) 용매를 포함하는 감광성 수지 조성물이고, 상기 첨가제는 레벨링제를 포함하고, 상기 레벨링제는 상기 감광성 수지 조성물의 총량 중 50 ppm 내지 1,000 ppm 으로 포함되는, 감광성 수지 조성물을 제공한다.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
title | PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER |
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