METHOD FORMANUFACTURING OF SILICANANO POWDER AND SLURRY FOR CHEMICALMECHANICAL POLISHING OF WAFER
본 발명은, 실리카 나노 분말 및 웨이퍼의 화학기계 연마용 슬러리 제조 방법을 제공한다. 본 발명의 실시예에 의한 실리카 나노 분말 제조 방법의 일 양태에서, 탈이온수, TEOS(Tetraethly orthosilicate), 암모니아수 및 수산화리튬이 에탄올에 혼합된 후 반응하여 실리카 나노 분말이 제조된다....
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| creator | LEE DUKHEE PARK KYUNGSOO KIM JAECHAN |
| description | 본 발명은, 실리카 나노 분말 및 웨이퍼의 화학기계 연마용 슬러리 제조 방법을 제공한다. 본 발명의 실시예에 의한 실리카 나노 분말 제조 방법의 일 양태에서, 탈이온수, TEOS(Tetraethly orthosilicate), 암모니아수 및 수산화리튬이 에탄올에 혼합된 후 반응하여 실리카 나노 분말이 제조된다. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20240145790A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20240145790A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20240145790A3</originalsourceid><addsrcrecordid>eNrjZEj0dQ3x8HdRcPMP8nX0C3VzdA4JDfL0c1fwd1MI9vTxdHb0c_TzVwjwD3dxDVJw9HNRCPYJDQqKBGlQcPZw9QWq8PF1dfZw9AOxgAp9PIM9oAaEO7q5BvEwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUknjvICMDIxMDQxNTc0sDR2PiVAEAl3A0qA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD FORMANUFACTURING OF SILICANANO POWDER AND SLURRY FOR CHEMICALMECHANICAL POLISHING OF WAFER</title><source>esp@cenet</source><creator>LEE DUKHEE ; PARK KYUNGSOO ; KIM JAECHAN</creator><creatorcontrib>LEE DUKHEE ; PARK KYUNGSOO ; KIM JAECHAN</creatorcontrib><description>본 발명은, 실리카 나노 분말 및 웨이퍼의 화학기계 연마용 슬러리 제조 방법을 제공한다. 본 발명의 실시예에 의한 실리카 나노 분말 제조 방법의 일 양태에서, 탈이온수, TEOS(Tetraethly orthosilicate), 암모니아수 및 수산화리튬이 에탄올에 혼합된 후 반응하여 실리카 나노 분말이 제조된다.</description><language>eng ; kor</language><subject>ADHESIVES ; CHEMISTRY ; COMPOUNDS THEREOF ; DYES ; INORGANIC CHEMISTRY ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; NON-METALLIC ELEMENTS ; PAINTS ; POLISHES ; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH ; SKI WAXES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241007&DB=EPODOC&CC=KR&NR=20240145790A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20241007&DB=EPODOC&CC=KR&NR=20240145790A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LEE DUKHEE</creatorcontrib><creatorcontrib>PARK KYUNGSOO</creatorcontrib><creatorcontrib>KIM JAECHAN</creatorcontrib><title>METHOD FORMANUFACTURING OF SILICANANO POWDER AND SLURRY FOR CHEMICALMECHANICAL POLISHING OF WAFER</title><description>본 발명은, 실리카 나노 분말 및 웨이퍼의 화학기계 연마용 슬러리 제조 방법을 제공한다. 본 발명의 실시예에 의한 실리카 나노 분말 제조 방법의 일 양태에서, 탈이온수, TEOS(Tetraethly orthosilicate), 암모니아수 및 수산화리튬이 에탄올에 혼합된 후 반응하여 실리카 나노 분말이 제조된다.</description><subject>ADHESIVES</subject><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>DYES</subject><subject>INORGANIC CHEMISTRY</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>NON-METALLIC ELEMENTS</subject><subject>PAINTS</subject><subject>POLISHES</subject><subject>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</subject><subject>SKI WAXES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZEj0dQ3x8HdRcPMP8nX0C3VzdA4JDfL0c1fwd1MI9vTxdHb0c_TzVwjwD3dxDVJw9HNRCPYJDQqKBGlQcPZw9QWq8PF1dfZw9AOxgAp9PIM9oAaEO7q5BvEwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUknjvICMDIxMDQxNTc0sDR2PiVAEAl3A0qA</recordid><startdate>20241007</startdate><enddate>20241007</enddate><creator>LEE DUKHEE</creator><creator>PARK KYUNGSOO</creator><creator>KIM JAECHAN</creator><scope>EVB</scope></search><sort><creationdate>20241007</creationdate><title>METHOD FORMANUFACTURING OF SILICANANO POWDER AND SLURRY FOR CHEMICALMECHANICAL POLISHING OF WAFER</title><author>LEE DUKHEE ; PARK KYUNGSOO ; KIM JAECHAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20240145790A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2024</creationdate><topic>ADHESIVES</topic><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>DYES</topic><topic>INORGANIC CHEMISTRY</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>NON-METALLIC ELEMENTS</topic><topic>PAINTS</topic><topic>POLISHES</topic><topic>POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH</topic><topic>SKI WAXES</topic><toplevel>online_resources</toplevel><creatorcontrib>LEE DUKHEE</creatorcontrib><creatorcontrib>PARK KYUNGSOO</creatorcontrib><creatorcontrib>KIM JAECHAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LEE DUKHEE</au><au>PARK KYUNGSOO</au><au>KIM JAECHAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FORMANUFACTURING OF SILICANANO POWDER AND SLURRY FOR CHEMICALMECHANICAL POLISHING OF WAFER</title><date>2024-10-07</date><risdate>2024</risdate><abstract>본 발명은, 실리카 나노 분말 및 웨이퍼의 화학기계 연마용 슬러리 제조 방법을 제공한다. 본 발명의 실시예에 의한 실리카 나노 분말 제조 방법의 일 양태에서, 탈이온수, TEOS(Tetraethly orthosilicate), 암모니아수 및 수산화리튬이 에탄올에 혼합된 후 반응하여 실리카 나노 분말이 제조된다.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng ; kor |
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| subjects | ADHESIVES CHEMISTRY COMPOUNDS THEREOF DYES INORGANIC CHEMISTRY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS NON-METALLIC ELEMENTS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES |
| title | METHOD FORMANUFACTURING OF SILICANANO POWDER AND SLURRY FOR CHEMICALMECHANICAL POLISHING OF WAFER |
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