PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER

본 기재는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러 필터에 관한 것이다. 일 구현예는 (A) 광중합 개시제; (B) 광중합성 화합물; (C) 착색제; 및 (D) 용매를 포함하되, 상기광중합 개시제는 하기 화학식 1로 표시되는 제1 광중합 개시제 및 하기 화학식 2로 표시되는 제2 광중합 개시제를 포함하는 감광성 수지 조성물을 제공한다: [화학식 1] TIFFpat00087.tif4168 [화학식 2] TIFFpat00088.tif4170. (상기 화학식 1 및 2는 명세서의 정의에 따른다.)...

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Hauptverfasser:	PARK DONGHYUN, PARK EUNBI, KWON HYUKSIN, KWON JIHYE, JUNG JUHO, KIM ICKJIN, PARK BAEK SOUNG, JEON YOUNGMIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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creator	PARK DONGHYUN PARK EUNBI KWON HYUKSIN KWON JIHYE JUNG JUHO KIM ICKJIN PARK BAEK SOUNG JEON YOUNGMIN
description	본 기재는 감광성 수지 조성물, 이를 이용하여 제조된 감광성 수지막 및 컬러 필터에 관한 것이다. 일 구현예는 (A) 광중합 개시제; (B) 광중합성 화합물; (C) 착색제; 및 (D) 용매를 포함하되, 상기광중합 개시제는 하기 화학식 1로 표시되는 제1 광중합 개시제 및 하기 화학식 2로 표시되는 제2 광중합 개시제를 포함하는 감광성 수지 조성물을 제공한다: [화학식 1] TIFFpat00087.tif4168 [화학식 2] TIFFpat00088.tif4170. (상기 화학식 1 및 2는 명세서의 정의에 따른다.)
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subjects	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
title	PHOTOSENSITIVE RESIN COMPOSITION PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER
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