광경화성 실리콘 수지 조성물, 그 경화물

본 발명은 환상 올레핀 수지 필름 및 성형체에 대하여 뛰어난 부착성을 갖고, 또한, 뛰어난 연필 경도를 부여할 수 있는 광경화성 실리콘 수지 조성물, 경화막, 및 그 적층체를 제공한다. 환상 올레핀 수지 필름의 하드 코트층으로서 사용하는 광경화성 실리콘 수지 조성물로서, 일반식(1) [RSiO3/2]n (1) 〔단, R은 (메타)아크릴로일기를 갖는 유기 관능기이며, n은 8, 10 또는 12이다〕으로 나타내어지고, 구조 단위 중에 바구니형 구조를 갖는 폴리오르가노실세스퀴옥산을 주된 성분으로서 포함하는 반응성 실리콘 수지(A1)와,...

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Hauptverfasser: SAITO TAKASHI, KAWATANI TOSHIHIRO
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creator SAITO TAKASHI
KAWATANI TOSHIHIRO
description 본 발명은 환상 올레핀 수지 필름 및 성형체에 대하여 뛰어난 부착성을 갖고, 또한, 뛰어난 연필 경도를 부여할 수 있는 광경화성 실리콘 수지 조성물, 경화막, 및 그 적층체를 제공한다. 환상 올레핀 수지 필름의 하드 코트층으로서 사용하는 광경화성 실리콘 수지 조성물로서, 일반식(1) [RSiO3/2]n (1) 〔단, R은 (메타)아크릴로일기를 갖는 유기 관능기이며, n은 8, 10 또는 12이다〕으로 나타내어지고, 구조 단위 중에 바구니형 구조를 갖는 폴리오르가노실세스퀴옥산을 주된 성분으로서 포함하는 반응성 실리콘 수지(A1)와, 1분자 중에 -R3-CR4=CH2 또는 -CR4=CH2〔단, R3은 알킬렌기, 알킬리덴기 또는 -O-C(=O)-기를 나타내고, R4는 수소 원자 또는 알킬기를 나타낸다〕로 나타내어지는 불포화기를 적어도 1개 포함함과 아울러 상기 실리콘 수지(A1)와 라디칼 공중합이 가능한 불포화 화합물(A2)을 1:99∼99:1의 질량비로 배합한 실리콘 수지 조성물(A) 100질량부와, 광중합 개시제(B) 0.1∼20질량부를 포함하는 광경화성 실리콘 수지 조성물이며, 상기 실리콘 수지 조성물(A)의 100g당의 아크릴 몰수가 0.8∼1.1이고, 실리콘 수지 조성물(A)의 20질량% 이상이 수산기를 포함하는 불포화 화합물이며, 광중합 개시제(B)로서 벤조페논계 광중합 개시제를 사용하는 것을 특징으로 하는 광경화성 실리콘 수지 조성물. The present invention provides: a photocurable silicone resin composition that has excellent adhesiveness with respect to a cyclic olefin resin film and a molded body, and which can provide excellent pencil hardness; a cured film; and a laminate thereof. Provided is a photocurable silicone resin composition to be used as a hard coat layer of a cyclic olefin resin film, said photocurable silicone resin composition being characterized by comprising: 100 parts by mass of a silicone resin composition (A) containing, at a mass ratio of 1:99-99:1, a reactive silicone resin (A1) that contains, as the main component, a polyorganosilsesquioxane which has a cage structure in the structural unit thereof and is represented by general formula (1) [RSiO3/2]n (1) (where R is an organic functional group having a (meth)acryloyl group, and n is 8, 10, or 12), and an unsaturated compound (A2) that contains in one molecule thereof at least one unsaturated group which is represented by -R3-CR4=CH2 or -CR4=CH2 (where R3 represents an alkylene group, an alkylidene group, or a -O-C(=O)- group, and R4 represents a hydrogen atom or an alkyl group) and that is capable of radical copolymerization with the silicone resin (A1); and 0.1-20 parts by mass of a photopolymerization initiator (B), wherein the number of moles of acrylic in 100 g of the silicone resin composition (A) is 0.8-1.1, not less than 20 mass% of the silicone resin composition (A) is an unsaturated compound containing a hydroxyl group, and a benzophenone-based photopolymerization initiator is used as the photopolymerization initiator (B).
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20240122757A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20240122757A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20240122757A3</originalsourceid><addsrcrecordid>eNrjZDB7tWXiq017386c8qZlo8Kb7iWvl615s3eGwpuOGW-WNyi8WbgBKP56zR4dhVfbdyhAVAK5PAysaYk5xam8UJqbQdnNNcTZQze1ID8-tbggMTk1L7Uk3jvIyMDIxMDQyMjc1NzRmDhVAK8APhA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>광경화성 실리콘 수지 조성물, 그 경화물</title><source>esp@cenet</source><creator>SAITO TAKASHI ; KAWATANI TOSHIHIRO</creator><creatorcontrib>SAITO TAKASHI ; KAWATANI TOSHIHIRO</creatorcontrib><description>본 발명은 환상 올레핀 수지 필름 및 성형체에 대하여 뛰어난 부착성을 갖고, 또한, 뛰어난 연필 경도를 부여할 수 있는 광경화성 실리콘 수지 조성물, 경화막, 및 그 적층체를 제공한다. 환상 올레핀 수지 필름의 하드 코트층으로서 사용하는 광경화성 실리콘 수지 조성물로서, 일반식(1) [RSiO3/2]n (1) 〔단, R은 (메타)아크릴로일기를 갖는 유기 관능기이며, n은 8, 10 또는 12이다〕으로 나타내어지고, 구조 단위 중에 바구니형 구조를 갖는 폴리오르가노실세스퀴옥산을 주된 성분으로서 포함하는 반응성 실리콘 수지(A1)와, 1분자 중에 -R3-CR4=CH2 또는 -CR4=CH2〔단, R3은 알킬렌기, 알킬리덴기 또는 -O-C(=O)-기를 나타내고, R4는 수소 원자 또는 알킬기를 나타낸다〕로 나타내어지는 불포화기를 적어도 1개 포함함과 아울러 상기 실리콘 수지(A1)와 라디칼 공중합이 가능한 불포화 화합물(A2)을 1:99∼99:1의 질량비로 배합한 실리콘 수지 조성물(A) 100질량부와, 광중합 개시제(B) 0.1∼20질량부를 포함하는 광경화성 실리콘 수지 조성물이며, 상기 실리콘 수지 조성물(A)의 100g당의 아크릴 몰수가 0.8∼1.1이고, 실리콘 수지 조성물(A)의 20질량% 이상이 수산기를 포함하는 불포화 화합물이며, 광중합 개시제(B)로서 벤조페논계 광중합 개시제를 사용하는 것을 특징으로 하는 광경화성 실리콘 수지 조성물. The present invention provides: a photocurable silicone resin composition that has excellent adhesiveness with respect to a cyclic olefin resin film and a molded body, and which can provide excellent pencil hardness; a cured film; and a laminate thereof. Provided is a photocurable silicone resin composition to be used as a hard coat layer of a cyclic olefin resin film, said photocurable silicone resin composition being characterized by comprising: 100 parts by mass of a silicone resin composition (A) containing, at a mass ratio of 1:99-99:1, a reactive silicone resin (A1) that contains, as the main component, a polyorganosilsesquioxane which has a cage structure in the structural unit thereof and is represented by general formula (1) [RSiO3/2]n (1) (where R is an organic functional group having a (meth)acryloyl group, and n is 8, 10, or 12), and an unsaturated compound (A2) that contains in one molecule thereof at least one unsaturated group which is represented by -R3-CR4=CH2 or -CR4=CH2 (where R3 represents an alkylene group, an alkylidene group, or a -O-C(=O)- group, and R4 represents a hydrogen atom or an alkyl group) and that is capable of radical copolymerization with the silicone resin (A1); and 0.1-20 parts by mass of a photopolymerization initiator (B), wherein the number of moles of acrylic in 100 g of the silicone resin composition (A) is 0.8-1.1, not less than 20 mass% of the silicone resin composition (A) is an unsaturated compound containing a hydroxyl group, and a benzophenone-based photopolymerization initiator is used as the photopolymerization initiator (B).</description><language>kor</language><subject>ADHESIVES ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COMPOSITIONS BASED THEREON ; CORRECTING FLUIDS ; DYES ; FILLING PASTES ; INKS ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC MACROMOLECULAR COMPOUNDS ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240813&amp;DB=EPODOC&amp;CC=KR&amp;NR=20240122757A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240813&amp;DB=EPODOC&amp;CC=KR&amp;NR=20240122757A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SAITO TAKASHI</creatorcontrib><creatorcontrib>KAWATANI TOSHIHIRO</creatorcontrib><title>광경화성 실리콘 수지 조성물, 그 경화물</title><description>본 발명은 환상 올레핀 수지 필름 및 성형체에 대하여 뛰어난 부착성을 갖고, 또한, 뛰어난 연필 경도를 부여할 수 있는 광경화성 실리콘 수지 조성물, 경화막, 및 그 적층체를 제공한다. 환상 올레핀 수지 필름의 하드 코트층으로서 사용하는 광경화성 실리콘 수지 조성물로서, 일반식(1) [RSiO3/2]n (1) 〔단, R은 (메타)아크릴로일기를 갖는 유기 관능기이며, n은 8, 10 또는 12이다〕으로 나타내어지고, 구조 단위 중에 바구니형 구조를 갖는 폴리오르가노실세스퀴옥산을 주된 성분으로서 포함하는 반응성 실리콘 수지(A1)와, 1분자 중에 -R3-CR4=CH2 또는 -CR4=CH2〔단, R3은 알킬렌기, 알킬리덴기 또는 -O-C(=O)-기를 나타내고, R4는 수소 원자 또는 알킬기를 나타낸다〕로 나타내어지는 불포화기를 적어도 1개 포함함과 아울러 상기 실리콘 수지(A1)와 라디칼 공중합이 가능한 불포화 화합물(A2)을 1:99∼99:1의 질량비로 배합한 실리콘 수지 조성물(A) 100질량부와, 광중합 개시제(B) 0.1∼20질량부를 포함하는 광경화성 실리콘 수지 조성물이며, 상기 실리콘 수지 조성물(A)의 100g당의 아크릴 몰수가 0.8∼1.1이고, 실리콘 수지 조성물(A)의 20질량% 이상이 수산기를 포함하는 불포화 화합물이며, 광중합 개시제(B)로서 벤조페논계 광중합 개시제를 사용하는 것을 특징으로 하는 광경화성 실리콘 수지 조성물. The present invention provides: a photocurable silicone resin composition that has excellent adhesiveness with respect to a cyclic olefin resin film and a molded body, and which can provide excellent pencil hardness; a cured film; and a laminate thereof. Provided is a photocurable silicone resin composition to be used as a hard coat layer of a cyclic olefin resin film, said photocurable silicone resin composition being characterized by comprising: 100 parts by mass of a silicone resin composition (A) containing, at a mass ratio of 1:99-99:1, a reactive silicone resin (A1) that contains, as the main component, a polyorganosilsesquioxane which has a cage structure in the structural unit thereof and is represented by general formula (1) [RSiO3/2]n (1) (where R is an organic functional group having a (meth)acryloyl group, and n is 8, 10, or 12), and an unsaturated compound (A2) that contains in one molecule thereof at least one unsaturated group which is represented by -R3-CR4=CH2 or -CR4=CH2 (where R3 represents an alkylene group, an alkylidene group, or a -O-C(=O)- group, and R4 represents a hydrogen atom or an alkyl group) and that is capable of radical copolymerization with the silicone resin (A1); and 0.1-20 parts by mass of a photopolymerization initiator (B), wherein the number of moles of acrylic in 100 g of the silicone resin composition (A) is 0.8-1.1, not less than 20 mass% of the silicone resin composition (A) is an unsaturated compound containing a hydroxyl group, and a benzophenone-based photopolymerization initiator is used as the photopolymerization initiator (B).</description><subject>ADHESIVES</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>FILLING PASTES</subject><subject>INKS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>POLISHES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB7tWXiq017386c8qZlo8Kb7iWvl615s3eGwpuOGW-WNyi8WbgBKP56zR4dhVfbdyhAVAK5PAysaYk5xam8UJqbQdnNNcTZQze1ID8-tbggMTk1L7Uk3jvIyMDIxMDQyMjc1NzRmDhVAK8APhA</recordid><startdate>20240813</startdate><enddate>20240813</enddate><creator>SAITO TAKASHI</creator><creator>KAWATANI TOSHIHIRO</creator><scope>EVB</scope></search><sort><creationdate>20240813</creationdate><title>광경화성 실리콘 수지 조성물, 그 경화물</title><author>SAITO TAKASHI ; KAWATANI TOSHIHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20240122757A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2024</creationdate><topic>ADHESIVES</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>FILLING PASTES</topic><topic>INKS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>POLISHES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>SAITO TAKASHI</creatorcontrib><creatorcontrib>KAWATANI TOSHIHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SAITO TAKASHI</au><au>KAWATANI TOSHIHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>광경화성 실리콘 수지 조성물, 그 경화물</title><date>2024-08-13</date><risdate>2024</risdate><abstract>본 발명은 환상 올레핀 수지 필름 및 성형체에 대하여 뛰어난 부착성을 갖고, 또한, 뛰어난 연필 경도를 부여할 수 있는 광경화성 실리콘 수지 조성물, 경화막, 및 그 적층체를 제공한다. 환상 올레핀 수지 필름의 하드 코트층으로서 사용하는 광경화성 실리콘 수지 조성물로서, 일반식(1) [RSiO3/2]n (1) 〔단, R은 (메타)아크릴로일기를 갖는 유기 관능기이며, n은 8, 10 또는 12이다〕으로 나타내어지고, 구조 단위 중에 바구니형 구조를 갖는 폴리오르가노실세스퀴옥산을 주된 성분으로서 포함하는 반응성 실리콘 수지(A1)와, 1분자 중에 -R3-CR4=CH2 또는 -CR4=CH2〔단, R3은 알킬렌기, 알킬리덴기 또는 -O-C(=O)-기를 나타내고, R4는 수소 원자 또는 알킬기를 나타낸다〕로 나타내어지는 불포화기를 적어도 1개 포함함과 아울러 상기 실리콘 수지(A1)와 라디칼 공중합이 가능한 불포화 화합물(A2)을 1:99∼99:1의 질량비로 배합한 실리콘 수지 조성물(A) 100질량부와, 광중합 개시제(B) 0.1∼20질량부를 포함하는 광경화성 실리콘 수지 조성물이며, 상기 실리콘 수지 조성물(A)의 100g당의 아크릴 몰수가 0.8∼1.1이고, 실리콘 수지 조성물(A)의 20질량% 이상이 수산기를 포함하는 불포화 화합물이며, 광중합 개시제(B)로서 벤조페논계 광중합 개시제를 사용하는 것을 특징으로 하는 광경화성 실리콘 수지 조성물. The present invention provides: a photocurable silicone resin composition that has excellent adhesiveness with respect to a cyclic olefin resin film and a molded body, and which can provide excellent pencil hardness; a cured film; and a laminate thereof. Provided is a photocurable silicone resin composition to be used as a hard coat layer of a cyclic olefin resin film, said photocurable silicone resin composition being characterized by comprising: 100 parts by mass of a silicone resin composition (A) containing, at a mass ratio of 1:99-99:1, a reactive silicone resin (A1) that contains, as the main component, a polyorganosilsesquioxane which has a cage structure in the structural unit thereof and is represented by general formula (1) [RSiO3/2]n (1) (where R is an organic functional group having a (meth)acryloyl group, and n is 8, 10, or 12), and an unsaturated compound (A2) that contains in one molecule thereof at least one unsaturated group which is represented by -R3-CR4=CH2 or -CR4=CH2 (where R3 represents an alkylene group, an alkylidene group, or a -O-C(=O)- group, and R4 represents a hydrogen atom or an alkyl group) and that is capable of radical copolymerization with the silicone resin (A1); and 0.1-20 parts by mass of a photopolymerization initiator (B), wherein the number of moles of acrylic in 100 g of the silicone resin composition (A) is 0.8-1.1, not less than 20 mass% of the silicone resin composition (A) is an unsaturated compound containing a hydroxyl group, and a benzophenone-based photopolymerization initiator is used as the photopolymerization initiator (B).</abstract><oa>free_for_read</oa></addata></record>
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subjects ADHESIVES
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
COMPOSITIONS BASED THEREON
CORRECTING FLUIDS
DYES
FILLING PASTES
INKS
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORGANIC MACROMOLECULAR COMPOUNDS
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
POLISHES
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF MATERIALS THEREFOR
WOODSTAINS
title 광경화성 실리콘 수지 조성물, 그 경화물
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